DocumentCode :
1328944
Title :
Sputtering of SmCo Thin Films and Integration Into a Ferrofluidic Microactuator
Author :
Jue Chen ; Hoheisel, Dominik ; Rising, L.
Author_Institution :
Center for Production Technol., Leibniz Univ. Hannover, Garbsen, Germany
Volume :
47
Issue :
10
fYear :
2011
Firstpage :
4473
Lastpage :
4476
Abstract :
The fabrication of SmCo films using physical vapor deposition (PVD), patterning by wet-chemical etching, and liftoff techniques as well as annealing processes was investigated. The composition of the film can be adjusted by the applied sputter parameters, i.e., the deposition pressure, the substrate bias voltage, and the power density by using a composite target. An intrinsic coercivity Hci of sputtered SmCo films above 0.8 MA/m and a maximal energy product |B XH|max of above 70 kJ/m3 were achieved after an annealing process, respectively. A concept for the integration of sputtered SmCo permanent magnets in a ferrofluidic microactuator is presented. This microactuator consists of microcoil arrays which manipulate a ferrofluid plug in a microchannel. The permanent magnets provide holding positions for fixing the ferrofluid without power input.
Keywords :
annealing; cobalt alloys; coercive force; etching; magnetic fluids; magnetic thin films; metallic thin films; microactuators; permanent magnets; samarium alloys; sputter deposition; SmCo; annealing; coercivity; ferrofluidic microactuator; liftoff technique; permanent magnets; physical vapor deposition; power density; sputtering; substrate bias voltage; thin films; wet-chemical etching; Annealing; Coils; Etching; Microactuators; Permanent magnets; Sputtering; Stators; Active microoptics; SmCo; electromagnetic microactuator; ferrofluid; sputtering;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.2011.2147290
Filename :
6027570
Link To Document :
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