Title :
Direct UV patterning of thick hybrid glass films for micro-opto-mechanical structures
Author :
Rantala, J.T. ; Levy, R. ; Kivimäki, L. ; Descour, M.R.
Author_Institution :
VTT Electron., Oulu, Finland
fDate :
3/16/2000 12:00:00 AM
Abstract :
The hybrid sol-gel method is applied to the fabrication of optical and mechanical structures into a photosensitive glass material. High optical quality thick films and structures are fabricated by a one-step spin-coating process followed by direct UV imprinting. A material thickness of 27.5 μm and a maximum patterned thickness of 17.41 μm at an aspect ratio of 0.6 have been achieved. The material exhibits a minimum transmittance of 97% between 400 and 1100 nm, a refractive index of 1.491 and an RMS surface roughness of 14.8 nm after development
Keywords :
micro-optics; optical fabrication; optical glass; sol-gel processing; spin coating; thick films; ultraviolet lithography; 17.4 micron; 27.5 micron; MEMS; direct UV patterning; fabrication; high optical quality thick films; hybrid sol-gel method; micro-opto-mechanical structures; one-step spin-coating process; thick hybrid glass films;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:20000429