• DocumentCode
    1329485
  • Title

    Transparent Electronics for See-Through AMOLED Displays

  • Author

    Riedl, Thomas ; Görrn, Patrick ; Kowalsky, Wolfgang

  • Author_Institution
    Inst. of High-Freq. Technol., Tech. Univ. of Braunschweig, Braunschweig, Germany
  • Volume
    5
  • Issue
    12
  • fYear
    2009
  • Firstpage
    501
  • Lastpage
    508
  • Abstract
    Transparent thin-film-transistors (TFTs) with a channel semiconductor based on the zinc-tin-oxide (ZTO) system are presented. Specifically, the technological and material aspects of the plasma-assisted pulsed laser deposition of these materials are discussed. The supply of additional radical oxygen species will be evidenced to significantly reduce defects in the material and as a consequence allows for well-behaved n-channel TFTs with mobilities higher than 10 cm2 V-1 s-1 and a threshold voltage in the range of 0 V. In addition the devices are extremely stable versus bias/current stress, which is especially important for active matrix OLED applications. Based on a detailed understanding of the interaction of the TFT channels with oxygen a strategy for the thin-film encapsulation of the TFTs will be presented, which leaves their device characteristics unaffected.
  • Keywords
    LED displays; organic light emitting diodes; pulsed laser deposition; thin film transistors; channel semiconductor; n-channel TFT; plasma-assisted pulsed laser deposition; see-through AMOLED displays; thin-film encapsulation; thin-film transistors; transparent electronics; transparent thin-film-transistors; zinc-tin-oxide system; Active matrix organic light emitting diodes; Optical materials; Optical pulses; Plasma displays; Plasma materials processing; Pulsed laser deposition; Semiconductor lasers; Semiconductor materials; Stress; Threshold voltage; Active matrix organic light-emitting diodes (OLED); bias stress; passivation; stability; transparent thin-film transistors (TFTs); zinc–tin–oxide (ZTO);
  • fLanguage
    English
  • Journal_Title
    Display Technology, Journal of
  • Publisher
    ieee
  • ISSN
    1551-319X
  • Type

    jour

  • DOI
    10.1109/JDT.2009.2023093
  • Filename
    5331946