DocumentCode
1329837
Title
Monolayer
Transistors Beyond the Technology Road Map
Author
Alam, Khairul ; Lake, Roger K.
Author_Institution
Dept. of Electr. & Electron. Eng., East West Univ., Dhaka, Bangladesh
Volume
59
Issue
12
fYear
2012
Firstpage
3250
Lastpage
3254
Abstract
The performance of a 5-nm gate length monolayer MoS2 transistor is benchmarked against an ultrathin body Si transistor of similar dimensions and the ITRS requirements for 2026 low operating power (LOP) technology. The MoS2 transistor has a subthreshold slope of 70 mV/dec, an on -/off-current ratio of 4.8 × 104, a drive current of 238 μA/μm, a peak transconductance of 2.65 mS/μm, a total capacitance of 0.164 fF/μm, and an intrinsic switching delay of 0.276 ps. These numbers for the silicon competitor are 79 mV/dec, 1.8 × 104, 89 μA/μm, 1.22 mS/μm, 0.0733 fF/μm , and 0.331 ps, respectively. The heavier effective mass of the MoS2 significantly reduces the direct source-drain leakage current, and it increases the drive current and the transconductance. The performance metrics of MoS2 transistor are comparable to the ITRS 2026 LOP technology requirements.
Keywords
capacitance; effective mass; insulated gate field effect transistors; leakage currents; molybdenum compounds; monolayers; 2026 low operating power technology; ITRS 2026 LOP technology requirement; MoS2; capacitance; effective mass; gate length monolayer transistor; intrinsic switching delay; silicon competitor; size 5 nm; source-drain leakage current; technology road map; transconductance; Effective mass; FETs; Logic gates; Quantum capacitance; Silicon; Field effect transistors; monolayer $( hbox{MoS}_{2})$ ; non equilibrium Green\´s function; performance metrics;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2012.2218283
Filename
6343227
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