• DocumentCode
    1329837
  • Title

    Monolayer \\hbox {MoS}_{2} Transistors Beyond the Technology Road Map

  • Author

    Alam, Khairul ; Lake, Roger K.

  • Author_Institution
    Dept. of Electr. & Electron. Eng., East West Univ., Dhaka, Bangladesh
  • Volume
    59
  • Issue
    12
  • fYear
    2012
  • Firstpage
    3250
  • Lastpage
    3254
  • Abstract
    The performance of a 5-nm gate length monolayer MoS2 transistor is benchmarked against an ultrathin body Si transistor of similar dimensions and the ITRS requirements for 2026 low operating power (LOP) technology. The MoS2 transistor has a subthreshold slope of 70 mV/dec, an on -/off-current ratio of 4.8 × 104, a drive current of 238 μA/μm, a peak transconductance of 2.65 mS/μm, a total capacitance of 0.164 fF/μm, and an intrinsic switching delay of 0.276 ps. These numbers for the silicon competitor are 79 mV/dec, 1.8 × 104, 89 μA/μm, 1.22 mS/μm, 0.0733 fF/μm , and 0.331 ps, respectively. The heavier effective mass of the MoS2 significantly reduces the direct source-drain leakage current, and it increases the drive current and the transconductance. The performance metrics of MoS2 transistor are comparable to the ITRS 2026 LOP technology requirements.
  • Keywords
    capacitance; effective mass; insulated gate field effect transistors; leakage currents; molybdenum compounds; monolayers; 2026 low operating power technology; ITRS 2026 LOP technology requirement; MoS2; capacitance; effective mass; gate length monolayer transistor; intrinsic switching delay; silicon competitor; size 5 nm; source-drain leakage current; technology road map; transconductance; Effective mass; FETs; Logic gates; Quantum capacitance; Silicon; Field effect transistors; monolayer $( hbox{MoS}_{2})$; non equilibrium Green\´s function; performance metrics;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2012.2218283
  • Filename
    6343227