Title :
The Exchange Bias of a Permalloy and Ordered Epitaxial IrMn Thin Film Prepared From the Growth of Ultrathin [Ir/Mn] Multilayer
Author :
Chih-Hao Lee ; Chia-Jui Chang ; Ming-Hong Lee ; Yu-Chang Lin ; Huang, J.C.A.
Author_Institution :
Dept. of Eng. & Syst. Sci., Nat. Tsing Hua Univ., Hsinchu, Taiwan
Abstract :
The influence of Ir1-xMnx composition and post-annealing on structure and exchange bias of epitaxial Ir1-xMnx(~10 nm)/Ni80Fe20(7 nm) films were studied. The Ir1-xMnx layer was prepared by MBE growth of [Mn(0.4 nm <; X nm <; 0.7 nm)/Ir(0.2 nm)]N multilayer films. The optimal Hex increases to ~190 Oe after annealing at 533 K for 3 h. X-ray diffraction indicates that the strength of exchange bias is increased with the order parameter of Ir1-xMnx alloy.
Keywords :
Permalloy; X-ray diffraction; annealing; antiferromagnetic materials; exchange interactions (electron); ferromagnetic materials; iridium alloys; magnetic epitaxial layers; magnetic multilayers; manganese alloys; metallic epitaxial layers; molecular beam epitaxial growth; Ir1-xMnx-Ni80Fe20; MBE; Permalloy; X-ray diffraction; exchange bias; ordered epitaxial thin films; post-annealing; temperature 533 degC; time 3 h; ultrathin multilayer; Annealing; Atomic layer deposition; Epitaxial growth; Manganese; Nonhomogeneous media; Substrates; X-ray diffraction; Exchange bias; magnetic thin films; molecular beam epitaxy; x-ray diffraction;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.2011.2160333
