DocumentCode
1331128
Title
Exchange Bias Effect on the Relaxation Behavior of the IrMn/NiFe Bilayer System
Author
Abdulahad, F.B. ; Dung-Shung Hung ; Yu-Che Chiu ; Shang-Fan Lee
Author_Institution
Inst. of Phys., Acad. Sinica, Taipei, Taiwan
Volume
47
Issue
10
fYear
2011
Firstpage
4227
Lastpage
4230
Abstract
Magnetization dynamic of exchange bias IrMn/NiFe bilayers system were investigated. Samples with fixed ferromagnetic (FM) layer thickness of 25 nm and antiferromagnetic (AFM) layer thickness tAFM of 5, 10, 15 and 20 nm were deposited by dc-magnetron sputtering on buffered silicon substrates. The static exchange bias field extracted from the magnetization curves increased at the beginning with increasing AFM layer thickness then slightly decreased. The dynamic behavior was studied from the ferromagnetic resonance (FMR) spectra of the samples under external magnetic field in the range 50-750 Oe. The linewidth versus frequency was found to have two distinct slope regions for the samples with high exchange bias values. The damping coefficient at frequencies up to about 7 GHz is found to be generated from the intrinsic linewidth broadening and it has a similar tendency to the exchange bias field with increasing AFM layer thickness. At higher frequencies, the damping coefficient is generated from the extrinsic contributions to the linewidth broadening and its behavior with increasing AFM layer thickness follows the dynamic anisotropy.
Keywords
antiferromagnetic materials; damping; exchange interactions (electron); ferromagnetic materials; ferromagnetic resonance; iridium alloys; iron alloys; magnetic anisotropy; magnetic multilayers; magnetic relaxation; manganese alloys; nickel alloys; sputter deposition; AFM layer thickness; IrMn-NiFe; buffered silicon substrates; damping coefficient; dc-magnetron sputtering; dynamic anisotropy; exchange bias bilayer system; exchange bias effect; ferromagnetic layer thickness; ferromagnetic resonance spectra; intrinsic linewidth broadening; magnetization dynamics; relaxation behavior; size 10 nm; size 15 nm; size 20 nm; size 25 nm; size 5 nm; static exchange bias field; Damping; Magnetic resonance; Magnetization; Magnetomechanical effects; Perpendicular magnetic anisotropy; Dynamic response; exchange bias; magnetic microwave devices; magnetic resonance; magnetization processes;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.2011.2157321
Filename
6028002
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