Title :
Corner Effect and Local Volume Inversion in SiNW FETs
Author :
De Michielis, Luca ; Moselund, Kirsten E. ; Selmi, Luca ; Ionescu, Adrian M.
Author_Institution :
Nanoelectronic Devices Lab., Ecole Polytech. Fed. de Lausanne, Lausanne, Switzerland
fDate :
7/1/2011 12:00:00 AM
Abstract :
In this paper, a quantitative study of the corner effect and of the local volume inversion on gate-all-around MOSFETs based on numerical simulations has been carried out; different angles and doping levels are compared, in order to understand the impact of the corner regions on the total current. A method for the extraction of the threshold voltage and of the subthreshold slope of the corner region has been proposed, and the resulting values have been analyzed in order to understand their effects on the device characteristics.
Keywords :
MOSFET; doping profiles; elemental semiconductors; nanowires; semiconductor doping; silicon; MOSFET; NW; Si; corner effect; doping levels; local volume inversion; subthreshold slope; threshold voltage; Doping; Logic gates; MOSFETs; Nanotechnology; Semiconductor process modeling; Silicon; Threshold voltage; Corner effect; local volume inversion; multigate MOSFET; silicon nanowire (SiNW);
Journal_Title :
Nanotechnology, IEEE Transactions on
DOI :
10.1109/TNANO.2010.2080284
