Influence of Sputtering Gas Pressure on High-Frequency Soft Magnetic Properties of FeCoN Thin Film

Author

Feng Xu ; Zhiqin Liao ; Qijun Huang ; Chong Kim Ong ; Shandong Li

Author_Institution

Sch. of Mater. Sci. & Eng., Nanjing Univ. of Sci. & Technol., Nanjing, China

Volume

47

Issue

10

fYear

2011

Firstpage

3921

Lastpage

3923

Abstract

In this paper, the influences of sputtering gas pressure on the high-frequency soft magnetic properties of FeCoN thin films are investigated. Both the static soft magnetic properties and microwave characteristics of FeCoN thin films are found to be highly dependent on the pressure. The high-frequency magnetic properties are characterized with permeability spectra and discussed based on the Landau-Lifshitz-Gilbert equation. The damping factor changes with sputtering gas pressure, and the resonance frequency shows an extraordinary large tunability with sputtering gas pressure. The effects are suggested to be related to the film stress which is affected by the sputtering pressure. This work provides a convenient method to tune the high-frequency magnetic properties of FeCoN film.

Keywords

cobalt compounds; damping; ferromagnetic materials; high-frequency effects; iron compounds; magnetic hysteresis; magnetic permeability; magnetic thin films; soft magnetic materials; sputter deposition; FeCoN; Landau-Lifshitz-Gilbert equation; damping factor; high-frequency soft magnetic properties; microwave properties; permeability spectra; resonance frequency; sputtering gas pressure; thin films; Anisotropic magnetoresistance; Magnetic anisotropy; Magnetic properties; Permeability; Saturation magnetization; Soft magnetic materials; Sputtering; Damping; permeability spectra; soft magnetic thin film;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/TMAG.2011.2151834

Filename

6028226