DocumentCode :
1332996
Title :
The mechanism of voltage decay in corona-charged layers of silicon dioxide during UV irradiation
Author :
Amjadi, Houman
Author_Institution :
Inst. for Telecommun. & Electroacoustics, Tech. Hochschule Darmstadt, Germany
Volume :
7
Issue :
2
fYear :
2000
fDate :
4/1/2000 12:00:00 AM
Firstpage :
222
Lastpage :
228
Abstract :
The charge stability in thermally grown silicon dioxide layers during irradiation with monochromatic ultraviolet light has been investigated. The samples were charged by a constant-voltage corona method. A Xenon arc lamp in combination with a monochromator was used to generate mono-energetic photons. The surface potential was measured as a function of the photon energy, the irradiation intensity, the charge polarity and the substrate doping. In order to interpret the experimental results, different theoretical models were developed which consider the possibility of photo-ionization of trapped charges, multiphoton excitation in the dielectric, and injection of hot carriers from the substrate into the oxide layer. The discussion of the parameters derived from each model leads to the conclusion that electron injection from the substrate is most probably responsible for the voltage decay
Keywords :
corona; dielectric thin films; silicon compounds; surface potential; ultraviolet radiation effects; SiO2; charge stability; corona charging; hot carrier injection; multiphoton excitation; photoionization; silicon dioxide; surface potential; thermally grown dielectric layer; ultraviolet light irradiation; voltage decay; Corona; Current measurement; Dielectric measurements; Dielectric substrates; Semiconductor process modeling; Silicon compounds; Substrate hot electron injection; Thermal stability; Voltage; Xenon;
fLanguage :
English
Journal_Title :
Dielectrics and Electrical Insulation, IEEE Transactions on
Publisher :
ieee
ISSN :
1070-9878
Type :
jour
DOI :
10.1109/94.841813
Filename :
841813
Link To Document :
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