Title :
Remote millimeter-wave beam control by the illumination of a semiconductor
Author_Institution :
Sch. of Phys., Sydney Univ., NSW, Australia
fDate :
5/1/2000 12:00:00 AM
Abstract :
The aim of this paper is to use diffraction gratings, produced by projecting a grating pattern onto a semiconductor wafer from a remote location, to control the direction of a reflected beam. We find the conditions for which diffraction at the specular angle is small so that most of the radiation goes into adjacent interference maxima whose directions may be controlled by changing the period of the projected pattern. Some preliminary experiments are reported
Keywords :
diffraction gratings; electromagnetic wave diffraction; electromagnetic wave reflection; microwave photonics; millimetre wave devices; millimetre waves; optical control; semiconductor plasma; diffraction gratings; grating pattern projection; millimeter-wave beam control; photo-induced electron-hole plasma; projected pattern period; reflected beam direction control; remote millimeter-wave beam control; semiconductor illumination; semiconductor wafer; Conductivity; Diffraction gratings; Interference; Lighting; Millimeter wave technology; Optical diffraction; Optical reflection; Physics; Plasma devices; Strips;
Journal_Title :
Microwave Theory and Techniques, IEEE Transactions on
