Title :
Correlation of Measured Soft X-Ray Pulses With Modeled Dynamics of the Plasma Focus
Author :
Sing Lee ; Saw, S.H. ; Rawat, R.S. ; Lee, P. ; Talebitaher, A. ; Abdou, A.E. ; Perk Lin Chong ; Roy, F.A. ; Singh, A. ; Wong, D. ; Devi, K.
Author_Institution :
INTI, Int. Univ., Nilai, Malaysia
Abstract :
The six-phase Lee model code is used to fit the computed current waveform to the measured current waveform of INTI plasma focus (PF; 2.2 kJ at 12 kV), a T2 PF device, operated as a source of neon soft X-ray (SXR) with optimum yield around 2 torr of neon. The characteristic He-like and H-like neon line SXR pulse is measured using a pair of SXR detectors with selected filters that, by subtraction, has a photon energy window of 900 to 1550 eV covering the region of the characteristic neon SXR lines. From the analysis of the fitted current and the measured SXR pulses, the characteristic neon SXR pulses are correlated to the pinch dynamics, and the subsequent slightly harder SXR pulses are correlated to the anomalous resistance phase. The characteristic neon SXR yield is measured; the pulse has a duration of 25 ns. The characteristic neon SXR typically starts 10 ns before the pinch phase and continues through the end of the 10-ns pinch phase, tailing into the anomalous resistance phase. Harder SXR pulses, probably Bremsstrahlung, are correlated to the anomalous resistance phase, with the main pulse occurring nearly 200 ns after the characteristic neon SXR pulse.
Keywords :
pinch effect; plasma X-ray sources; plasma diagnostics; plasma focus; plasma simulation; plasma transport processes; H like neon line SXR pulse; He like neon line SXR pulse; INTI plasma focus; SXR detectors; T2 PF device; anomalous resistance phase; current waveform; energy 2.2 kJ; neon soft X-ray source; pinch dynamics; plasma focus dynamics; six phase Lee model code; soft X-ray pulses; voltage 12 kV; Current measurement; Detectors; Electrical resistance measurement; Plasmas; Pulse measurements; Radio access networks; Resistance; Neon soft X-rays (SXR); PF modeling; SXR measurements; plasma focus (PF) dynamics;
Journal_Title :
Plasma Science, IEEE Transactions on
DOI :
10.1109/TPS.2011.2166812