• DocumentCode
    1334110
  • Title

    Simulation of a Helicon plasma source using a multivariable fuzzy model

  • Author

    Zhang, Zibo ; Rayner, John P. ; Cheetham, Andrew D. ; Lund, Trevor

  • Author_Institution
    Fac. of Inf. Sci. & Eng., Canberra Univ., ACT, Australia
  • Volume
    26
  • Issue
    1
  • fYear
    1998
  • fDate
    2/1/1998 12:00:00 AM
  • Firstpage
    104
  • Lastpage
    112
  • Abstract
    This paper reports work on the development of an automatic control system for a Helicon plasma processing source. The lack of a definitive physical model for the plasma physics of the source and the power coupling mechanism to the plasma precludes the use of traditional control algorithms. This paper develops a fuzzy model that simulates the behavior of the plasma source using the process of genetic algorithms to identify and optimize the parameters of the fuzzy model. This type of model will eventually be used to test a fuzzy control system for the plasma source. In this work, an extensive set of experimental data was acquired where the magnetic field and input power to the plasma source were varied over a wide range while the electron number density was measured. From this learning dataset, the genetic algorithm derived the values of the parameters for the difference equation that describes the system. The fuzzy model so constructed was used to predict the behavior of the source from known input parameters. Comparing the predictions with experimental observations showed that the fuzzy model was generally able to predict the behavior of the plasma as its input parameters were varied with a precision of better than 10%
  • Keywords
    difference equations; fuzzy control; genetic algorithms; plasma production; plasma simulation; Helicon plasma source; automatic control system; difference equation; electron number density; fuzzy model; genetic algorithms; magnetic field; multivariable fuzzy model; physical model; power coupling mechanism; simulation; Automatic control; Genetic algorithms; Magnetic field measurement; Physics; Plasma materials processing; Plasma simulation; Plasma sources; Power system modeling; Predictive models; System testing;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.659539
  • Filename
    659539