• DocumentCode
    1337515
  • Title

    A proportional hazards approach to correlate SiO2-breakdown voltage and time distributions

  • Author

    Chan, C.K.

  • Author_Institution
    AT&T Bell Lab., Whippany, NJ, USA
  • Volume
    39
  • Issue
    2
  • fYear
    1990
  • fDate
    6/1/1990 12:00:00 AM
  • Firstpage
    147
  • Lastpage
    150
  • Abstract
    A new relationship for correlatingtime-to-breakdown and voltage-to-breakdown distributions is derived within the framework of proportional hazards models. The relationship is used to analyze the silicon dioxide breakdown data of D. Wolters, T. Hoogestyn, and H. Kraaij (WHK) (in The Physics of MOS Insulators, p.349-52, 1980). From the WHK data, the acceleration factor for every 1 MV/cm change in the applied electric field is estimated to be 100.7 at 300°C. The relationship can be used to estimate quickly the electric-field acceleration factor, using the time-to-breakdown data measured at one fixed voltage and the voltage-to-breakdown data measured at a single voltage ramp rate
  • Keywords
    electric breakdown of solids; insulating thin films; reliability; silicon compounds; 300 degC; SiO2 films; electric-field acceleration factor; proportional hazards approach; reliability; time-to-breakdown; voltage-to-breakdown; Accelerometers; Breakdown voltage; Circuit testing; Electric breakdown; Electric variables measurement; Hazards; Histograms; Life estimation; Measurement standards; Silicon compounds;
  • fLanguage
    English
  • Journal_Title
    Reliability, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9529
  • Type

    jour

  • DOI
    10.1109/24.55873
  • Filename
    55873