DocumentCode
1337951
Title
Efficiency and Electron Leakage Characteristics in GaN-Based Light-Emitting Diodes Without AlGaN Electron-Blocking-Layer Structures
Author
Ryu, Han-Youl ; Shim, Jong-In ; Kim, Cheol-Hoi ; Choi, Jin Hyoung ; Jung, Hyun Min ; Noh, Min-Soo ; Lee, Jong-Moo ; Nam, Eun-Soo
Author_Institution
Dept. of Phys., Inha Univ., Incheon, South Korea
Volume
23
Issue
24
fYear
2011
Firstpage
1866
Lastpage
1868
Abstract
The authors investigate efficiency and electron leakage characteristics in GaN-based light-emitting diodes (LEDs) without AlGaN electron-blocking-layer (EBL) structures. Both simulation and electroluminescence (EL) measurement results show that the internal quantum efficiency decreases rapidly as the thickness of an undoped GaN interlayer between active layers and a p-GaN layer increases, which is caused by electron leakage from active layers to the p-GaN due to inefficient hole injection. However, photoluminescence (PL) measurement results show that the quality of active layers deteriorates as the interlayer thickness decreases. The EL and PL results imply that the optimization of the undoped GaN interlayer thickness is important for achieving high internal quantum efficiency in AlGaN-EBL-free LEDs.
Keywords
III-V semiconductors; electroluminescence; gallium compounds; light emitting diodes; photoluminescence; wide band gap semiconductors; GaN; active layers; electroluminescence measurement; electron leakage; electron-blocking-layer structures; hole injection; interlayer thickness; internal quantum efficiency; light-emitting diodes; photoluminescence; undoped interlayer; Aluminum gallium nitride; Charge carrier processes; Current density; Gallium nitride; Light emitting diodes; Quantum well devices; AlGaN; InGaN; electron blocking layer (EBL); light-emitting diode (LED);
fLanguage
English
Journal_Title
Photonics Technology Letters, IEEE
Publisher
ieee
ISSN
1041-1135
Type
jour
DOI
10.1109/LPT.2011.2170409
Filename
6032725
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