Title :
A Novel Nanofabrication Damascene Lift-Off Technique
Author :
Maraghechi, P. ; Cadien, K. ; Elezzabi, A.Y.
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Alberta, Edmonton, AB, Canada
fDate :
7/1/2011 12:00:00 AM
Abstract :
We introduce a new lift-off technique, which, compared to the conventional lift-off process, has both high yield (>;90%) and high reproducibility (>;95%). It has been shown that by etching after pattern transfer and prior to material deposition, the adhesion of the deposited material to the substrate is improved and roughness of feature edges is eliminated. This procedure is tailored to meet fabrication reproducibility criteria for nanoscale as well as microscale features.
Keywords :
adhesion; chromium; etching; nanofabrication; nanostructured materials; surface roughness; Cr; adhesion; etching; material deposition; nanofabrication damascene lift-off technique; pattern transfer; reproducibility; surface roughness; Etching; Fabrication; Nanoscale devices; Resists; Substrates; Edge roughness; lift-off process; lithography; nanofabrication;
Journal_Title :
Nanotechnology, IEEE Transactions on
DOI :
10.1109/TNANO.2010.2081374
