DocumentCode
1338253
Title
A Novel Nanofabrication Damascene Lift-Off Technique
Author
Maraghechi, P. ; Cadien, K. ; Elezzabi, A.Y.
Author_Institution
Dept. of Electr. & Comput. Eng., Univ. of Alberta, Edmonton, AB, Canada
Volume
10
Issue
4
fYear
2011
fDate
7/1/2011 12:00:00 AM
Firstpage
822
Lastpage
826
Abstract
We introduce a new lift-off technique, which, compared to the conventional lift-off process, has both high yield (>;90%) and high reproducibility (>;95%). It has been shown that by etching after pattern transfer and prior to material deposition, the adhesion of the deposited material to the substrate is improved and roughness of feature edges is eliminated. This procedure is tailored to meet fabrication reproducibility criteria for nanoscale as well as microscale features.
Keywords
adhesion; chromium; etching; nanofabrication; nanostructured materials; surface roughness; Cr; adhesion; etching; material deposition; nanofabrication damascene lift-off technique; pattern transfer; reproducibility; surface roughness; Etching; Fabrication; Nanoscale devices; Resists; Substrates; Edge roughness; lift-off process; lithography; nanofabrication;
fLanguage
English
Journal_Title
Nanotechnology, IEEE Transactions on
Publisher
ieee
ISSN
1536-125X
Type
jour
DOI
10.1109/TNANO.2010.2081374
Filename
5587897
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