DocumentCode
1340735
Title
Combined optical and electric simulation of metal-semiconductor-metal photodetectors
Author
Körner, T.O.
Author_Institution
ISE Integrated Syst. Eng. AG, Zurich, Switzerland
Volume
147
Issue
2
fYear
2000
fDate
4/1/2000 12:00:00 AM
Firstpage
89
Lastpage
95
Abstract
The combined optical and electric simulation of a metal-semiconductor-metal (MSM) photodetector is presented. The generalised multipole technique (GMT) for rigorous modelling of the light propagation is combined with electric device simulation methods based on a drift-diffusion charge carrier transport model. Different optical designs are compared with respect to the detector performance that can be achieved. It is demonstrated that the use of incoupling gratings can significantly increase the detector efficiency, compared to designs using antireflective layers. Numerical experiments carried out for illumination under varying angles of incidence also show that not only the amount of light that reaches the semiconducting substrate but also the exact spatial intensity distribution have non-negligible effects on the detector efficiency and response times. This in turn proves the necessity of rigorous optical simulation
Keywords
carrier mobility; diffraction gratings; light propagation; metal-semiconductor-metal structures; optical design techniques; photodetectors; semiconductor device models; MSM photodetectors; antireflective layers; combined optical/electric simulation; detector efficiency; detector performance; drift-diffusion charge carrier transport model; electric device simulation methods; exact spatial intensity distribution; generalised multipole technique; incoupling gratings; light propagation; metal-semiconductor-metal photodetectors; optical designs; response times; rigorous modelling; rigorous optical simulation; semiconducting substrate; varying angles of incidence;
fLanguage
English
Journal_Title
Optoelectronics, IEE Proceedings -
Publisher
iet
ISSN
1350-2433
Type
jour
DOI
10.1049/ip-opt:20000293
Filename
844441
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