• DocumentCode
    1341203
  • Title

    DRAM technology perspective for gigabit era

  • Author

    Kim, Kinam ; Hwang, Chang-Gyu ; Lee, Jong Gil

  • Author_Institution
    Samsung Electron. Co., Kyungki-Do, South Korea
  • Volume
    45
  • Issue
    3
  • fYear
    1998
  • fDate
    3/1/1998 12:00:00 AM
  • Firstpage
    598
  • Lastpage
    608
  • Abstract
    Many challenges emerge as the DRAM enters into a generation of the gigabit density era. Most of the challenges come from the shrink technology which scales down minimum feature size by a factor of 0.84 per year. The need for higher performance to narrow the bandwidth mismatch between fast processors and slower memories and lower power consumption drives the DRAM technology toward smaller cell size, faster memory cell operation, less power consumption, and longer data retention times. In addition, increasingly complicated wafer processing requires simple process. In this paper, the challenges brought from the extremely small minimum feature, high performance, and simple wafer processing will be discussed. The solutions to overcome the challenges will be described focusing on the memory cell scheme, lithography, device, memory cell capacitor, and metallization
  • Keywords
    DRAM chips; integrated circuit technology; DRAM technology; bandwidth mismatch; capacitor; data retention time; gigabit density; lithography; memory cell; metallization; power consumption; wafer processing; Bandwidth; Capacitors; Energy consumption; Gas insulated transmission lines; Integrated circuit technology; Lithography; Manufacturing processes; Metallization; Microprocessors; Random access memory;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.661221
  • Filename
    661221