DocumentCode
1341203
Title
DRAM technology perspective for gigabit era
Author
Kim, Kinam ; Hwang, Chang-Gyu ; Lee, Jong Gil
Author_Institution
Samsung Electron. Co., Kyungki-Do, South Korea
Volume
45
Issue
3
fYear
1998
fDate
3/1/1998 12:00:00 AM
Firstpage
598
Lastpage
608
Abstract
Many challenges emerge as the DRAM enters into a generation of the gigabit density era. Most of the challenges come from the shrink technology which scales down minimum feature size by a factor of 0.84 per year. The need for higher performance to narrow the bandwidth mismatch between fast processors and slower memories and lower power consumption drives the DRAM technology toward smaller cell size, faster memory cell operation, less power consumption, and longer data retention times. In addition, increasingly complicated wafer processing requires simple process. In this paper, the challenges brought from the extremely small minimum feature, high performance, and simple wafer processing will be discussed. The solutions to overcome the challenges will be described focusing on the memory cell scheme, lithography, device, memory cell capacitor, and metallization
Keywords
DRAM chips; integrated circuit technology; DRAM technology; bandwidth mismatch; capacitor; data retention time; gigabit density; lithography; memory cell; metallization; power consumption; wafer processing; Bandwidth; Capacitors; Energy consumption; Gas insulated transmission lines; Integrated circuit technology; Lithography; Manufacturing processes; Metallization; Microprocessors; Random access memory;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.661221
Filename
661221
Link To Document