DocumentCode :
1341203
Title :
DRAM technology perspective for gigabit era
Author :
Kim, Kinam ; Hwang, Chang-Gyu ; Lee, Jong Gil
Author_Institution :
Samsung Electron. Co., Kyungki-Do, South Korea
Volume :
45
Issue :
3
fYear :
1998
fDate :
3/1/1998 12:00:00 AM
Firstpage :
598
Lastpage :
608
Abstract :
Many challenges emerge as the DRAM enters into a generation of the gigabit density era. Most of the challenges come from the shrink technology which scales down minimum feature size by a factor of 0.84 per year. The need for higher performance to narrow the bandwidth mismatch between fast processors and slower memories and lower power consumption drives the DRAM technology toward smaller cell size, faster memory cell operation, less power consumption, and longer data retention times. In addition, increasingly complicated wafer processing requires simple process. In this paper, the challenges brought from the extremely small minimum feature, high performance, and simple wafer processing will be discussed. The solutions to overcome the challenges will be described focusing on the memory cell scheme, lithography, device, memory cell capacitor, and metallization
Keywords :
DRAM chips; integrated circuit technology; DRAM technology; bandwidth mismatch; capacitor; data retention time; gigabit density; lithography; memory cell; metallization; power consumption; wafer processing; Bandwidth; Capacitors; Energy consumption; Gas insulated transmission lines; Integrated circuit technology; Lithography; Manufacturing processes; Metallization; Microprocessors; Random access memory;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.661221
Filename :
661221
Link To Document :
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