DocumentCode :
1341675
Title :
The change in refractive index of AlGaAs/GaAs single quantum wells due to impurity-induced mixing
Author :
Li, E. Herbert ; Weiss, Bernard L.
Author_Institution :
Dept. of Electron. & Electr. Eng., Surrey Univ., Guildford, UK
Volume :
3
Issue :
9
fYear :
1991
Firstpage :
787
Lastpage :
789
Abstract :
The authors report the results of some calculations of the effect of the width and shape of the quantum well on the change of the refractive index of a single 100 AA thick square GaAs quantum well with thick A1/sub 0.30/Ga/sub 0.70/As barriers. The refractive-index difference between implanted and unimplanted layers after impurity-induced mixing has been calculated for a variety of structures. The results show that a large refractive-index difference can be achieved for heavily mixed wide wells for use at longer wavelengths, while negative refractive-index changes can be predicted for the moderate mixing case. The application of these results to multiquantum-well waveguides also predicts the conditions for the transition between guiding and antiguiding in waveguides.<>
Keywords :
III-V semiconductors; aluminium compounds; chemical interdiffusion; gallium arsenide; optical waveguides; refractive index; semiconductor quantum wells; 100 AA; AlGaAs/GaAs single quantum wells; GaAs-Al/sub 0.30/Ga/sub 0.70/As; III-V semiconductor; antiguiding; implanted layers; impurity-induced mixing; multiquantum-well waveguides; refractive index; unimplanted layers; Annealing; Gallium arsenide; Impurities; Optical device fabrication; Optical refraction; Optical waveguides; Quantum well devices; Refractive index; Shape; Temperature;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/68.84493
Filename :
84493
Link To Document :
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