A microcomputer-based novel deposition controller for preparing films with graded composition

Author

Shivalingappa, L. ; Rao, K.Narasimha ; Mohan, S.

Author_Institution

Dept. of Instrum., Indian Inst. of Sci., Bangalore, India

Volume

36

Issue

3

fYear

2000

Firstpage

928

Lastpage

934

Abstract

A novel microcomputer-based electron beam (EB) deposition technique has been developed for preparing thin films with graded composition. A conventional EB gun crucible has been modified to accommodate two constituent materials. Necessary electronic hardware and a software-based INTEL 8085 microcomputer have been built to provide the crucible rotation with the required speed and for changing the emission currents for the EB gun. Mixed oxide films of CeO₂ and SiO ₂ with composition varying along their thicknesses have been prepared. The composition gradation has been altered by varying the deposition rate and rotational speed of individual constituents. The atomic percentages of Ce, Si, and O have been computed from deposition parameters and correlated with the data obtained from Auger spectroscopy

Keywords

Auger electron spectroscopy; cerium compounds; electron beam deposition; electron guns; microcomputer applications; silicon compounds; vacuum deposited coatings; vacuum deposition; 6 kW; Auger spectroscopy; CeO₂; CeO₂-SiO₂; SiO₂; atomic percentages; crucible rotation; electron beam deposition technique; electron beam gun crucible; electronic hardware; emission currents; graded composition films; microcomputer-based deposition controller; mixed oxide films; software-based INTEL 8085 microcomputer; thickness variation; Electron beams; Gases; Hardware; Industry Applications Society; Microcomputers; Optical films; Process control; Sputtering; Substrates; Weight control;

fLanguage

English

Journal_Title

Industry Applications, IEEE Transactions on

Publisher

ieee

ISSN

0093-9994

Type

jour

DOI

10.1109/28.845074

Filename

845074