DocumentCode
1342323
Title
The Effects of Aging and Hydrogen on the Radiation Response of Gated Lateral PNP Bipolar Transistors
Author
Hughart, David R. ; Schrimpf, Ronald D. ; Fleetwood, Daniel M. ; Chen, X. Jie ; Barnaby, Hugh J. ; Holbert, Keith E. ; Pease, Ronald L. ; Platteter, Dale G. ; Tuttle, Blair R. ; Pantelides, Sokrates T.
Author_Institution
Electr. Eng. & Comput. Sci. Dept., Vanderbilt Univ., Nashville, TN, USA
Volume
56
Issue
6
fYear
2009
Firstpage
3361
Lastpage
3366
Abstract
Complex interplay between hydrogen-related defect formation and passivation is observed in irradiated bipolar transistors. Hydrogen soaking experiments are performed to evaluate the dependence of defect buildup and annealing in gated lateral bipolar transistors on hydrogen exposure. Comparisons of the radiation responses of transistors tested in 2009 to identical devices from the same wafer tested in 2003 show that aging has reduced the amount of radiation-induced interface trap and oxide trapped charge formation in most cases. These results demonstrate that the way in which the radiation response of a hydrogen-sensitive device evolves with age depends on whether hydrogen is diffusing into or out of the device, and whether the initial defect concentration favors passivation or depassivation reactions. These results strongly suggest that hydrogen exposure cannot replace low-dose-rate irradiation in ELDRS tests for bipolar devices and ICs without extensive characterization testing.
Keywords
ageing; annealing; bipolar transistors; diffusion; doping profiles; hydrogen; integrated circuit testing; interface states; passivation; radiation effects; ELDRS test; IC testing; P-glass passivation; SiO2:P-H2; aging; annealing; diffusion; hydrogen soaking experiment; hydrogen-related defect concentration; hydrogen-sensitive device; irradiated gated lateral PNP bipolar transistor; phosphorus-doped silicon dioxide; radiation-induced interface trap; Aging; Annealing; Bipolar transistors; Degradation; Hydrogen; Ionizing radiation; Passivation; Performance evaluation; Radiation effects; Semiconductor device testing; Aging; annealing; gated lateral bipolar transistor; hardness assurance; hydrogen; interface traps; oxide trapped charge; radiation effects;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.2009.2034151
Filename
5341350
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