• DocumentCode
    1342323
  • Title

    The Effects of Aging and Hydrogen on the Radiation Response of Gated Lateral PNP Bipolar Transistors

  • Author

    Hughart, David R. ; Schrimpf, Ronald D. ; Fleetwood, Daniel M. ; Chen, X. Jie ; Barnaby, Hugh J. ; Holbert, Keith E. ; Pease, Ronald L. ; Platteter, Dale G. ; Tuttle, Blair R. ; Pantelides, Sokrates T.

  • Author_Institution
    Electr. Eng. & Comput. Sci. Dept., Vanderbilt Univ., Nashville, TN, USA
  • Volume
    56
  • Issue
    6
  • fYear
    2009
  • Firstpage
    3361
  • Lastpage
    3366
  • Abstract
    Complex interplay between hydrogen-related defect formation and passivation is observed in irradiated bipolar transistors. Hydrogen soaking experiments are performed to evaluate the dependence of defect buildup and annealing in gated lateral bipolar transistors on hydrogen exposure. Comparisons of the radiation responses of transistors tested in 2009 to identical devices from the same wafer tested in 2003 show that aging has reduced the amount of radiation-induced interface trap and oxide trapped charge formation in most cases. These results demonstrate that the way in which the radiation response of a hydrogen-sensitive device evolves with age depends on whether hydrogen is diffusing into or out of the device, and whether the initial defect concentration favors passivation or depassivation reactions. These results strongly suggest that hydrogen exposure cannot replace low-dose-rate irradiation in ELDRS tests for bipolar devices and ICs without extensive characterization testing.
  • Keywords
    ageing; annealing; bipolar transistors; diffusion; doping profiles; hydrogen; integrated circuit testing; interface states; passivation; radiation effects; ELDRS test; IC testing; P-glass passivation; SiO2:P-H2; aging; annealing; diffusion; hydrogen soaking experiment; hydrogen-related defect concentration; hydrogen-sensitive device; irradiated gated lateral PNP bipolar transistor; phosphorus-doped silicon dioxide; radiation-induced interface trap; Aging; Annealing; Bipolar transistors; Degradation; Hydrogen; Ionizing radiation; Passivation; Performance evaluation; Radiation effects; Semiconductor device testing; Aging; annealing; gated lateral bipolar transistor; hardness assurance; hydrogen; interface traps; oxide trapped charge; radiation effects;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.2009.2034151
  • Filename
    5341350