Title :
Specimen size effect on tensile strength of surface-micromachined polycrystalline silicon thin films
Author :
Tsuchiya, Toshiyuki ; Tabata, Osamu ; Sakata, Jiro ; Taga, Yasunori
Author_Institution :
Toyota Central Res. & Dev. Labs. Inc., Aichi, Japan
fDate :
3/1/1998 12:00:00 AM
Abstract :
A new tensile tester using an electrostatic-force grip was developed to evaluate the tensile strength and the reliability of thin-film materials. The tester was constructed in a scanning electron microscope (SEM) chamber for in situ observation and was applied for tensile testing of polycrystalline silicon (poly-Si) thin films with dimensions of 30-300 μm long, 2-5 μm wide, and 2 μm thick. It was found that the mean tensile strengths of nondoped and P-doped poly-Si are 2.0-2.8 and 2.0-2.7 GPa, respectively, depending on the length of the specimens, irrespective of the specimen width. Statistical analysis of these size effects on the tensile strength predicted that the location of the fracture origin was on the edge of the specimen, which was Identified by the SEM observation of the fracture surface of the thin films
Keywords :
Weibull distribution; elemental semiconductors; fracture; micromachining; scanning electron microscopy; semiconductor thin films; silicon; tensile strength; tensile testing; Si; Si:P; electrostatic-force grip; fracture surface; reliability; scanning electron microscopy; specimen size effect; statistical analysis; surface-micromachined polycrystalline silicon thin film; tensile strength; tensile tester; Electrostatic measurements; Materials testing; Microstructure; Scanning electron microscopy; Semiconductor thin films; Silicon; Statistical analysis; Surface cracks; Thin film devices; Transistors;
Journal_Title :
Microelectromechanical Systems, Journal of