DocumentCode :
1342806
Title :
Charge Enhancement Effects in 6H-SiC MOSFETs Induced by Heavy Ion Strike
Author :
Onoda, Shinobu ; Makino, Takahiro ; Iwamoto, Naoya ; Vizkelethy, Gyorgy ; Kojima, Kazutoshi ; Nozaki, Shinji ; Ohshima, Takeshi
Author_Institution :
Japan Atomic Energy Agency, Takasaki, Japan
Volume :
57
Issue :
6
fYear :
2010
Firstpage :
3373
Lastpage :
3379
Abstract :
The transient response of Silicon Carbide (SiC) Metal-Oxide-Semiconductor Field Effect Transistors (MOSFETs) with three different gates due to a single ion strike is studied. Comparing the experiment and numerical simulation, it is suggested that the charge enhancement is due to the bipolar effect. We find the bipolar gain depends on the quality of gate oxide. The impact of fixed charge in SiO2 and interface traps at SiC/SiO2 on the charge collection is discussed.
Keywords :
MOSFET; bipolar logic circuits; nuclear electronics; silicon compounds; SiO2-SiC; bipolar effect; charge collection; charge enhancement effect; interface traps; metal-oxide-semiconductor-field effect transistor; numerical simulation; silicon carbide; Ions; Logic gates; MOSFETs; Silicon carbide; Transient analysis; 6H-SiC; MOSFET; bipolar effect; single ion strike;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.2010.2070076
Filename :
5594660
Link To Document :
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