Title :
Device Simulation of Monolithic Active Pixel Sensors: Radiation Damage Effects
Author :
Fourches, Nicolas T.
Author_Institution :
Commissariat a l´´Energie Atomique, CEN Saclay, Gif-sur-Yvette, France
Abstract :
Vertexing for the future International Linear Collider represents a challenging goal because of the high spatial resolution required with low material budget and high ionizing radiation tolerance. CMOS Monolithic Active Pixel Sensors (MAPS) represent a good potential solution for this purpose. Up to now many MAPS sensors have been developed. They are based on various architectures and manufactured in different processes. However, up so far, the sensor diode has not been the subject of extensive modelization and simulation. Published simulation studies of sensor-signal formation have been less numerous than measurements on real sensors. This is a cause for concern because such sensor is physically based on the partially depleted diode, in the vicinity of which the electric field collects the minority carriers generated by an incident MIP (minimum ionizing particle). Although the microscopic mechanisms are well known and modelized, the global physical mechanisms for signal formation are not very rigorously established. This is partly due to the presence of a predominant diffusion component in the charge transport. We present here simulations mainly based on the S-PISCES code, in which physical mechanisms affecting transport are taken into account. Diffusion, influence of residual carrier concentration due to the doping level in the sensitive volume, and more importantly charge trapping due to deep levels in the active (detecting) layer are studied together with geometric aspects. The effect of neutron irradiation is studied to assess the effects of deep traps. A comparison with available experimental data, obtained on processed MAPS before or after neutron irradiation will be introduced. Simulated reconstruction of the Minimum Ionizing Particle (MIP) point of impact in two dimensions is also investigated. For further steps, guidelines for process choices of next Monolithic Active Pixel Sensors are introduced.
Keywords :
CMOS image sensors; carrier density; deep levels; diffusion; doping; hole traps; neutron effects; position sensitive particle detectors; semiconductor device models; semiconductor doping; silicon radiation detectors; CMOS Monolithic Active Pixel Sensors; International Linear Collider; MAPS; MIP; S-PISCES code; carrier concentration; charge transport; charge trapping; deep levels; device simulation; diffusion; diffusion component; doping level; electric field; high ionizing radiation tolerance; microscopic mechanisms; minimum ionizing particle; minority carriers generation; neutron irradiation effect; radiation damage effects; sensor diode; sensor-signal formation study; silicon material; spatial resolution; Diodes; Doping; Guidelines; Ionizing radiation; Ionizing radiation sensors; Manufacturing processes; Microscopy; Neutrons; Semiconductor device modeling; Spatial resolution; CMOS; MAPS; PISCES; defect; device simulation; neutrons; radiation damage;
Journal_Title :
Nuclear Science, IEEE Transactions on
DOI :
10.1109/TNS.2009.2031540