• DocumentCode
    1343018
  • Title

    Nanocrystalline silicon thickness dependence of transmission characteristics of CPWs on surface-passivated highresistivity silicon substrates

  • Author

    Wang, R.-L. ; Su, Yan-Kuin ; Chen, Chuan-Jie ; Hsueh, Ting-Jen

  • Author_Institution
    Dept. of Electron. Eng., Nat. Kaohsiung Normal Univ., Yanchao, Taiwan
  • Volume
    47
  • Issue
    20
  • fYear
    2011
  • Firstpage
    1133
  • Lastpage
    1134
  • Abstract
    A nanocrystalline silicon (nc-Si) layer was used as a surface-passivation layer (SPL) on a high-resistivity silicon (HR-Si) substrate. The transmission loss (αTL) of coplanar waveguide (CPW) lines on oxide/SPL/HR-Si substrates with an nc-Si SPL of 100, 200, and 400 nm was measured and analysed. The experimental results demonstrate that the thicker nc-Si SPL provides better passivation effect and the αTL can be down to 0.69 dB/cm. The equivalent series resistance and shunt conductance were extracted to investigate the dependence of αTL on the SPL thickness. The cross-talk effect of CPWs on oxide/SPL/HR-Si substrates was also studied.
  • Keywords
    coplanar waveguides; nanostructured materials; silicon; CPW; coplanar waveguide lines; crosstalk effect; nanocrystalline silicon layer; nanocrystalline silicon thickness; shunt conductance; surface-passivated high-resistivity silicon substrates; surface-passivation layer; transmission characteristics; transmission loss;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el.2011.2030
  • Filename
    6036061