DocumentCode
1343018
Title
Nanocrystalline silicon thickness dependence of transmission characteristics of CPWs on surface-passivated highresistivity silicon substrates
Author
Wang, R.-L. ; Su, Yan-Kuin ; Chen, Chuan-Jie ; Hsueh, Ting-Jen
Author_Institution
Dept. of Electron. Eng., Nat. Kaohsiung Normal Univ., Yanchao, Taiwan
Volume
47
Issue
20
fYear
2011
Firstpage
1133
Lastpage
1134
Abstract
A nanocrystalline silicon (nc-Si) layer was used as a surface-passivation layer (SPL) on a high-resistivity silicon (HR-Si) substrate. The transmission loss (αTL) of coplanar waveguide (CPW) lines on oxide/SPL/HR-Si substrates with an nc-Si SPL of 100, 200, and 400 nm was measured and analysed. The experimental results demonstrate that the thicker nc-Si SPL provides better passivation effect and the αTL can be down to 0.69 dB/cm. The equivalent series resistance and shunt conductance were extracted to investigate the dependence of αTL on the SPL thickness. The cross-talk effect of CPWs on oxide/SPL/HR-Si substrates was also studied.
Keywords
coplanar waveguides; nanostructured materials; silicon; CPW; coplanar waveguide lines; crosstalk effect; nanocrystalline silicon layer; nanocrystalline silicon thickness; shunt conductance; surface-passivated high-resistivity silicon substrates; surface-passivation layer; transmission characteristics; transmission loss;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el.2011.2030
Filename
6036061
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