DocumentCode :
1343689
Title :
The Effect of a TiN Interlayer on the Tribological Properties of Diamond-like Carbon Films Deposited on 7A04 Aluminum Alloy
Author :
Su, Yongyao ; Gui, X. ; Xie, D. ; Li, S.Y. ; Sun, H. ; Leng, Yongxiang ; Huang, N.
Author_Institution :
Key Lab. for Adv. Technol. of Mater., Southwest Jiaotong Univ., Chengdu, China
Volume :
39
Issue :
11
fYear :
2011
Firstpage :
3144
Lastpage :
3148
Abstract :
Aluminum-based alloys are known to be significant candidates in the automotive and aerospace industries. However, the relatively poor wear resistance of aluminum alloys restricts their further application. In this paper, diamond-like carbon (DLC) films are deposited on the 7A04 aluminum alloy to improve its wear resistance by electron cyclotron resonance plasma-enhanced chemical vapor deposition. Before the DLC film deposition, TiN films were first fabricated as interlayer between the 7A04 aluminum alloy and DLC films by unbalanced magnetron sputtering. The influence of the TiN buffer layer on the mechanical properties of the DLC film is studied. The results showed that the TiN interlayer could provide enough mechanical support for the DLC films by suppressing plastic deformation of the aluminum alloy and then could effectively improve wear resistance of DLC films on 7A04 aluminum alloy.
Keywords :
cyclotron resonance; diamond-like carbon; plasma CVD; plastic deformation; sputter deposition; thin films; titanium compounds; wear resistance; 7A04 aluminum alloy; DLC; diamond-like carbon films; electron cyclotron resonance plasma-enhanced chemical vapor deposition; mechanical properties; plastic deformation; tribological properties; unbalanced magnetron sputtering; wear resistance; Aluminum alloys; Educational institutions; Resistance; Substrates; Tin; Aluminum alloy; TiN interlayer; diamond-like carbon (DLC); wear resistance;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.2011.2169091
Filename :
6036184
Link To Document :
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