DocumentCode
1349064
Title
Stability Analysis of Cr-MIS Solar Cells
Author
Rajeswaran, G. ; Anderson, W.A. ; Thayer, M. ; Lee, B.W.
Author_Institution
Department of Electrical and Computer Engineering; State University of New York at Buffalo; 4232 Ridge Lea Road; Amherst, New York 14226 USA.
Issue
3
fYear
1982
Firstpage
276
Lastpage
280
Abstract
The 50 Ã
Cu/30 Ã
Cr/20 Ã
SiO,/Si solar cell structure has been analyzed by Auger, ESCA and ellipsometer measurements. An oxidation-reduction failure mechanism has been proposed for shelf-life degradation, and experimental evidence for such behavior is presented. The effect of this degradation is a decrease in the oxide thickness at the interface bringing about a photovoltaic performance degradation. The performance degradation involves a typical change in Voc, from about 0.55 V to 0.52 V with little or no change in Jsc or fill factor. The performance of all Cr-MIS devices then stabilizes when a thermodynamic equilibrium is attained. The light-effect degradation is more complex and the rearrangement of bonding in the interface oxide and at the SiOx/Si interface might reduce the rate of degradation. The Cr-MIS solar cell should be designed with an oxide thickness more than the static optimum value to allow for a decrease in oxide thickness to the optimum value.
Keywords
Chromium; Degradation; Failure analysis; Life testing; Photovoltaic cells; Photovoltaic systems; Reliability engineering; Silicon; Solar power generation; Stability analysis; Degradation mechanism; MIS solar cell;
fLanguage
English
Journal_Title
Reliability, IEEE Transactions on
Publisher
ieee
ISSN
0018-9529
Type
jour
DOI
10.1109/TR.1982.5221337
Filename
5221337
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