DocumentCode :
1349488
Title :
Model and Observations of Dielectric Charge in Thermally Oxidized Silicon Resonators
Author :
Bahl, Gaurav ; Melamud, Renata ; Kim, Bongsang ; Chandorkar, Saurabh A. ; Salvia, James C. ; Hopcroft, Matthew A. ; Elata, David ; Hennessy, Robert G. ; Candler, Rob N. ; Howe, Roger T. ; Kenny, Thomas W.
Author_Institution :
Dept. of Electr. Eng., Stanford Univ., Stanford, CA, USA
Volume :
19
Issue :
1
fYear :
2010
Firstpage :
162
Lastpage :
174
Abstract :
This paper investigates the effects of dielectric charge on resonant frequency in thermally oxidized silicon resonators hermetically encapsulated using ??epi-seal.?? SiO2 coatings are effective for passive temperature compensation of resonators but make the devices more susceptible to charging-related issues. We present a theoretical model for the electromechanical effects of charge trapped in the dielectrics within the transduction gap of a resonator. Observations of resonance frequency against varying resonator bias voltage are fitted to this model in order to obtain estimates for the magnitude of the trapped oxide charge. Statistics collected from wet- and dry-oxidized devices show that lower fixed oxide charge can be expected upon dry oxidation. In addition, observations of time-varying resonator frequency indicate the presence of mobile oxide charge in a series of voltage biasing and temperature experiments.
Keywords :
coatings; compensation; electromechanical effects; resonators; silicon compounds; SiO2; dielectric charge; dry-oxidized devices; electromechanical effects; mobile oxide charge; passive temperature compensation; thermally oxidized silicon resonators; time-varying resonator frequency; trapped oxide charge; voltage biasing; wet-oxidized devices; Charging; dielectrics; frequency drift; reliability; resonators; silicon dioxide;
fLanguage :
English
Journal_Title :
Microelectromechanical Systems, Journal of
Publisher :
ieee
ISSN :
1057-7157
Type :
jour
DOI :
10.1109/JMEMS.2009.2036274
Filename :
5345822
Link To Document :
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