DocumentCode :
1350808
Title :
Compact modeling of high-frequency distortion in silicon integrated bipolar transistors
Author :
Schröter, Michael ; Pehlke, David R. ; Lee, Tzung-Yin
Author_Institution :
Tech. Univ. Dresden, Germany
Volume :
47
Issue :
7
fYear :
2000
fDate :
7/1/2000 12:00:00 AM
Firstpage :
1529
Lastpage :
1535
Abstract :
The high-frequency distortion behavior of integrated silicon bipolar transistors is investigated experimentally and theoretically. Single-tone measurements using an automated setup are performed on transistors with various sizes and of different type, that were fabricated in a state-of-the-art production process offering high-speed and high-voltage transistor versions. The measured data, which were taken on devices laid out in usual high-frequency test pads, are compared to the advanced compact model HICUM showing excellent agreement over input power, bias, and frequency. In addition, a simplified model is used together with a Volterra-series approach to identify the nonlinear effects that are most important at high frequencies
Keywords :
UHF bipolar transistors; UHF measurement; Volterra series; elemental semiconductors; high-speed integrated circuits; power bipolar transistors; semiconductor device measurement; semiconductor device models; silicon; HICUM; Si; UHF; Volterra-series approach; advanced compact model; automated setup; bias; bipolar transistors; frequency; high-frequency distortion modelling; high-frequency test pads; high-speed transistor versions; high-voltage transistor versions; input power; nonlinear effects; simplified model; single-tone measurements; state-of-the-art production process; Bipolar transistors; Distortion measurement; Frequency measurement; Nonlinear distortion; Performance evaluation; Power measurement; Production; Silicon; Size measurement; Testing;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.848303
Filename :
848303
Link To Document :
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