DocumentCode
1350808
Title
Compact modeling of high-frequency distortion in silicon integrated bipolar transistors
Author
Schröter, Michael ; Pehlke, David R. ; Lee, Tzung-Yin
Author_Institution
Tech. Univ. Dresden, Germany
Volume
47
Issue
7
fYear
2000
fDate
7/1/2000 12:00:00 AM
Firstpage
1529
Lastpage
1535
Abstract
The high-frequency distortion behavior of integrated silicon bipolar transistors is investigated experimentally and theoretically. Single-tone measurements using an automated setup are performed on transistors with various sizes and of different type, that were fabricated in a state-of-the-art production process offering high-speed and high-voltage transistor versions. The measured data, which were taken on devices laid out in usual high-frequency test pads, are compared to the advanced compact model HICUM showing excellent agreement over input power, bias, and frequency. In addition, a simplified model is used together with a Volterra-series approach to identify the nonlinear effects that are most important at high frequencies
Keywords
UHF bipolar transistors; UHF measurement; Volterra series; elemental semiconductors; high-speed integrated circuits; power bipolar transistors; semiconductor device measurement; semiconductor device models; silicon; HICUM; Si; UHF; Volterra-series approach; advanced compact model; automated setup; bias; bipolar transistors; frequency; high-frequency distortion modelling; high-frequency test pads; high-speed transistor versions; high-voltage transistor versions; input power; nonlinear effects; simplified model; single-tone measurements; state-of-the-art production process; Bipolar transistors; Distortion measurement; Frequency measurement; Nonlinear distortion; Performance evaluation; Power measurement; Production; Silicon; Size measurement; Testing;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.848303
Filename
848303
Link To Document