Thermocurable polymers as resists for imprint lithography

In nanoimprint lithography, high pressures are utilised for embossing thermoplastics. This may introduce mechanical strain in the mould and the sample. By using a thermocurable polymer (polydimethylsiloxane, PDMS), a low pressure imprint process, working at pressures of <0.2 MPa, has proven viable. The new process may drastically reduce the thermal budget and the mechanical load in imprint lithography.