DocumentCode
1353713
Title
Resistive Switching Properties of
Structure for Low-Voltage Nonvolatile Memory Applications
Author
Li, Yingtao ; Long, Shibing ; Zhang, Manhong ; Liu, Qi ; Shao, Lubing ; Zhang, Sen ; Wang, Yan ; Zuo, Qingyun ; Liu, Su ; Liu, Ming
Author_Institution
Lab. of Nano-Fabrication & Novel Devices Integrated Technol., Chinese Acad. of Sci., Beijing, China
Volume
31
Issue
2
fYear
2010
Firstpage
117
Lastpage
119
Abstract
The reliable resistive switching properties of Au/ZrO2/ Ag structure fabricated with full room temperature process are demonstrated in this letter. The tested devices show low operation voltages (< 1 V), high resistance ratio (about 104), fast switching speed (50 ns), and reliable data retention (ten years extrapolation at both RT and 85 ??C). Moreover, the benefits of high yield and multilevel storage possibility make them promising in the next generation nonvolatile memory applications.
Keywords
gold; low-power electronics; random-access storage; zirconium compounds; Au-ZrO2-Ag; low-voltage nonvolatile memory; resistance random access memory; resistive switching property; $hbox{ZrO}_{2}$ ; Nonvolatile memory; resistance random access memory (RRAM); resistive switching;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2009.2036276
Filename
5352234
Link To Document