• DocumentCode
    1354736
  • Title

    Gate-voltage dependence of low-frequency noise in GaN/AlGaN heterostructure field-effect transistors

  • Author

    Balandin, A.

  • Author_Institution
    Dept. of Electr. Eng., California Univ., Riverside, CA, USA
  • Volume
    36
  • Issue
    10
  • fYear
    2000
  • fDate
    5/11/2000 12:00:00 AM
  • Firstpage
    912
  • Lastpage
    913
  • Abstract
    The gate-voltage dependence of low-frequency noise in GaN/AlGaN heterostructure field-effect transistors has been investigated in the linear and subsaturation regions. Analysis of experimental data for different transistors indicates that for all examined biases the noise spectrum is dominated by the channel noise rather than noise originating in the series resistors. The obtained results shed new light on the noise sources and may lead to improvements in the noise performance of GaN transistors
  • Keywords
    III-V semiconductors; aluminium compounds; gallium compounds; junction gate field effect transistors; semiconductor device noise; GaN-AlGaN; GaN/AlGaN heterostructure field effect transistor; gate voltage dependence; low-frequency noise;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:20000680
  • Filename
    850525