DocumentCode :
1354741
Title :
Silicon planar ACCUFET: improved power MOSFET structure
Author :
Bobde, M.D. ; Baliga, B.J.
Author_Institution :
Power Semicond. Res. Center, North Carolina State Univ., Raleigh, NC, USA
Volume :
36
Issue :
10
fYear :
2000
fDate :
5/11/2000 12:00:00 AM
Firstpage :
913
Lastpage :
915
Abstract :
An improved power MOSFET structure in silicon. Called the planar ACCUmulation channel field effect transistor (planar ACCUFET) is proposed. In this device, the P base and the deep P+ regions of the conventional DMOSFET are replaced by a depleted N-type base region created using a buried P+ region. Numerical simulations show that the planar ACCUFET has good forward blocking characteristics with low leakage current. The specific on-resistance, as well as the gate charge of the planar ACCUFET are lower than those of a DMOSFET with the same voltage rating. Furthermore, the planar ACCUFET requires a smaller thermal budget for fabrication than the DMOSFET
Keywords :
elemental semiconductors; power MOSFET; silicon; Si; fabrication; forward blocking; gate charge; leakage current; numerical simulation; planar accumulation channel field effect transistor; power MOSFET; silicon planar ACCUFET; specific on-resistance; thermal budget;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:20000647
Filename :
850526
Link To Document :
بازگشت