Title :
Low-Operating-Voltage Operation and Improvement in Sensitivity With Passivated OFET Sensors for Determining Total Dose Radiation
Author :
Raval, Harshil N. ; Rao, V. Ramgopal
Author_Institution :
Dept. of Electr. Eng., Indian Inst. of Technol., Mumbai, India
Abstract :
Using high-k material in a gate dielectric stack, low-operating-voltage organic semiconducting material sensors for determining total dose radiation are proposed. To improve the stability of organic semiconducting layer in the atmospheric conditions, a thin silicon nitride layer deposited by hot-wire CVD process was used as a passivation layer. Furthermore, in order to achieve higher sensitivity, a parallel connection of organic field-effect transistors (OFETs) is explored in this letter. These sensors are exposed to ionizing radiation using a cobalt-60 radiation source for different total dose values. A three-times improvement in sensitivity was observed in the off current with a three-OFET array.
Keywords :
chemical vapour deposition; high-k dielectric thin films; organic field effect transistors; organic semiconductors; passivation; silicon compounds; SiN; atmospheric conditions; cobalt-60 radiation source; gate dielectric stack; high-k material; hot-wire CVD process; low-operating-voltage operation; organic field effect transistors; organic semiconducting layer; organic semiconducting material sensors; passivated OFET sensors; thin silicon nitride layer; total dose radiation; Ionizing radiation; Ionizing radiation sensors; Logic gates; OFETs; Sensitivity; Sensor phenomena and characterization; Array of organic field-effect transistor (OFET) sensors; improved sensitivity; ionizing radiation;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2010.2074179