DocumentCode :
1355077
Title :
Low contact resistance of poly-plug structure by in-situ HF-vapour cleaning
Author :
Jiann Heng Chen ; Lei, Tan Fu ; Chao, Tien Sheng ; Su, Tien Pao ; Huang, J. ; Tuan, A. ; Chen, Jiann Heng
Author_Institution :
Dept. of Electron. Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan
Volume :
36
Issue :
8
fYear :
2000
fDate :
4/13/2000 12:00:00 AM
Firstpage :
756
Lastpage :
757
Abstract :
A low contact-resistance poly-plug structure realised by in-situ HF-vapour cleaning in a clustered tool is described. The native oxide in the contact area can be efficiently removed by the combination of an HF-dipping and in-situ HF-vapour cleaning process, resulting in a low specific contact resistance
Keywords :
cluster tools; contact resistance; metallisation; surface cleaning; HF; HF dipping; cluster tool; contact resistance; in-situ HF vapour cleaning; native oxide removal; poly-plug structure;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:20000580
Filename :
850578
Link To Document :
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