DocumentCode :
135583
Title :
Effect of boron doping on optical and electrical properties of p-type a-Si∶H films for thin film solar cells application
Author :
Singh, Chandra Bhal ; Bhattacharya, Surya ; Ahmed, Nova ; Bhargav, P. Balaji
Author_Institution :
SSN Res. Centre, Kalavakkam, India
fYear :
2014
fDate :
16-17 Jan. 2014
Firstpage :
38
Lastpage :
42
Abstract :
We report the effect of boron doping on optical and electrical properties of p-type a-Si:H films. The p-type a-Si:H thin films have been deposited by RF-PECVD system varying the diborane flow rate from 5 sccm to 9 sccm. Enhancement in deposition rate from 30.3 nm/min to 33.6 nm reported with increasing diborane gas flow rate. Change in band gap, refractive index and Urbach energy with varying doping level is studied. An increase in dark conductivity is reported with increasing boron concentration. Solar cells fabricated with 4.63% efficiency.
Keywords :
boron; dark conductivity; doping profiles; elemental semiconductors; energy gap; plasma CVD; refractive index; semiconductor doping; semiconductor thin films; silicon; solar cells; RF-PECVD; Si:H,B; Urbach energy; band gap; boron concentration; boron doping; dark conductivity; diborane flow rate; doping level; electrical properties; optical properties; refractive index; thin film solar cells; Indexes; Integrated optics; Optical films; Optical imaging; Optical refraction; Optical variables measurement; Amorphous silicon; Boron doping; Open circuit Voltage; Refractive Index; thin film solar cell;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Non Conventional Energy (ICONCE), 2014 1st International Conference on
Conference_Location :
Kalyani
Print_ISBN :
978-1-4799-3339-6
Type :
conf
DOI :
10.1109/ICONCE.2014.6808678
Filename :
6808678
Link To Document :
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