DocumentCode :
1356379
Title :
EUV´s Underdog Light Source Will Have Its Day [Update]
Author :
Adee, Sally
Volume :
47
Issue :
11
fYear :
2010
fDate :
11/1/2010 12:00:00 AM
Firstpage :
13
Lastpage :
14
Abstract :
A new plasma source may outshine contenders for the next chip lithography technique.
fLanguage :
English
Journal_Title :
Spectrum, IEEE
Publisher :
ieee
ISSN :
0018-9235
Type :
jour
DOI :
10.1109/MSPEC.2010.5605875
Filename :
5605875
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1356379
