• DocumentCode
    1357169
  • Title

    Analysis of negative differential resistance in the I-V characteristics of shorted-anode LIGBT´s

  • Author

    Simpson, Mark R.

  • Author_Institution
    North American Philips Corp., Briarcliff Manor, NY, USA
  • Volume
    38
  • Issue
    7
  • fYear
    1991
  • fDate
    7/1/1991 12:00:00 AM
  • Firstpage
    1633
  • Lastpage
    1640
  • Abstract
    The physical mechanism responsible for the negative differential resistance (NDR) in the current-voltage characteristics of the shorted anode lateral insulated gate bipolar transistor (SA-LIGBT) is explained through two-dimensional numerical simulation. The NDR regime is an inherent feature of all SA-LIGBTs, and results from the two different conduction mechanisms responsible for current flow in the device. These conduction mechanisms are minority-carrier injection and majority-carrier flow. Since both the anode geometry and the doping profile control the onset and the degree of minority-carrier injection, the effect these parameters have on the NDR is investigated. A simple lumped-element equivalent model of the SA-LIGBT allows qualitative predictions to be made on how changes in the device geometry and doping profiles influence the NDR regime. It is shown that conductivity modulation is a necessary but not sufficient condition for the occurrence of negative resistance in SA-LIGBT devices. Also required is a large voltage drop in the high-resistivity drift region before conductivity modulation is initiated. This causes small changes in the anode current level, greatly decreasing the total resistance across the drift region
  • Keywords
    equivalent circuits; insulated gate bipolar transistors; minority carriers; negative resistance; power transistors; semiconductor device models; I-V characteristics; NDR regime; anode geometry; conduction mechanisms; conductivity modulation; current-voltage characteristics; doping profile; high-resistivity drift region; lateral IGBT; lateral insulated gate bipolar transistor; lumped-element equivalent model; majority-carrier flow; minority-carrier injection; negative differential resistance; shorted-anode; two-dimensional numerical simulation; Anodes; Conductivity; Current-voltage characteristics; Doping profiles; Geometry; Insulated gate bipolar transistors; Numerical simulation; Predictive models; Semiconductor process modeling; Solid modeling;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.85160
  • Filename
    85160