DocumentCode :
1357804
Title :
InP-based reversed-mesa ridge-waveguide structure for high-performance long-wavelength laser diodes
Author :
Aoki, Masahiro ; Komori, Masaaki ; Tsuchiya, Tomonobu ; Sato, Hiroshi ; Nakahara, Kouji ; Uomi, Kazuhisa
Author_Institution :
Central Res. Lab., Hitachi Ltd., Tokyo, Japan
Volume :
3
Issue :
2
fYear :
1997
fDate :
4/1/1997 12:00:00 AM
Firstpage :
672
Lastpage :
683
Abstract :
A novel structure for an InP-based ridge-waveguide (RWG) laser is demonstrated. It has a reverse-trapezoid-ridge shape which offers reduced threshold current and smaller electrical and thermal resistances over the conventional vertical-mesa (VM) RWG devices. We found this new RWG laser quite suitable for wide-temperature-range and high-power operations. 1.3-1.55-μm wavelength strained InGaAsP-InP multiple quantum-well (MQW) lasers were demonstrated with the new ridge structure, which showed sufficient lasing behavior such as high-temperature lasing up to 165°C and a high light output over 300 mW. This simple and high-performance laser structure was also applied for integrated lasers with other functional elements such as an absorption-type modulator or a beam-expander waveguide lens. To achieve low-threshold current operation in RWG lasers, suppression of the lateral-current spreading is important. We proposed a new method to effectively reduce this lateral diffusion current by using a doped active region with n-type dopant. Combined by the reduced transparency carrier density in the n-doped active region, this leads to a very low-threshold current of less than 2.2 mA for a coated 200-μm-long cavity device, which is comparable to those of recent advanced same-material buried-heterostructure (BH) lasers. These excellent lasing properties, along with the sufficient device reliability under strict environmental conditions, make this reversed-mesa (RM) RWG a promising candidate for the widespread use of low-cost long-wavelength light sources
Keywords :
III-V semiconductors; carrier density; distributed feedback lasers; electric resistance; electro-optical modulation; electroabsorption; environmental testing; gallium arsenide; high-temperature effects; indium compounds; integrated optics; laser reliability; laser transitions; life testing; optical communication equipment; optical losses; quantum well lasers; ridge waveguides; semiconductor doping; semiconductor laser arrays; thermal resistance; waveguide lasers; 1.3 to 1.55 mum; 165 degC; 2.2 mA; 200 mum; 300 mW; InGaAsP-InP; InP-based reversed-mesa ridge-waveguide structure; MQW; RWG laser; absorption-type modulator; beam-expander waveguide lens; doped active region; electrical resistance; functional elements; high light output; high-performance laser structure; high-performance long-wavelength laser diodes; high-power operations; high-temperature lasing; integrated lasers; lateral diffusion current; lateral-current spreading suppression; low-threshold current operation; n-doped active region; reduced threshold current; reduced transparency carrier density; reverse-trapezoid-ridge shape; strained InGaAsP-InP multiple quantum-well lasers; thermal resistance; very low-threshold current; wide-temperature-range; Charge carrier density; Lenses; Optical modulation; Quantum well devices; Quantum well lasers; Shape; Thermal resistance; Threshold current; Virtual manufacturing; Waveguide lasers;
fLanguage :
English
Journal_Title :
Selected Topics in Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
1077-260X
Type :
jour
DOI :
10.1109/2944.605720
Filename :
605720
Link To Document :
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