DocumentCode
1358977
Title
Reply to Comments on “1.88-
1650-V Normally on 4H-SiC TI-VJFET”
Author
Li, Yuzhu ; Alexandrov, Petre ; Zhao, Jian H.
Author_Institution
Elecronic Devices Inst., Nanjing, China
Volume
57
Issue
12
fYear
2010
Firstpage
3543
Lastpage
3547
Abstract
The arguments presented in the above comments are refuted. The following are pointed out: 1) Veliadis´ papers did not include the vertical-junction field-effect transistor (VJFET) dimensions required for readers to make technical analysis and comparison. 2) The current through the gate p-n junction of a VJFET is also affected by the ohmic contact and metal spreading resistance; therefore, the external gate terminal voltage alone does not determine whether a VJFET is operated in bipolar mode or not. 3) A longer vertical channel with a more invariant or uniform vertical-channel opening makes it much easier to realize higher performance and higher voltage normally-off JFETs because of the lower channel resistance and the larger drain voltage needed to punch through the drain-to-source barrier.
Keywords
junction gate field effect transistors; ohmic contacts; p-n junctions; silicon compounds; 4H-SiC TI-VJFET; external gate terminal voltage; gate p-n junction; metal spreading resistance; ohmic contact; vertical-junction field-effect transistor; Ion implantation; JFETs; Power transistors; Silicon carbide; Junction field effect transistors (JFET); normally-off; normally-on; power transistors; silicon carbide; vertical channel;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2010.2079190
Filename
5607303
Link To Document