• DocumentCode
    1358977
  • Title

    Reply to Comments on “1.88- \\hbox {m}\\Omega \\cdot \\hbox {cm}^{2} 1650-V Normally on 4H-SiC TI-VJFET”

  • Author

    Li, Yuzhu ; Alexandrov, Petre ; Zhao, Jian H.

  • Author_Institution
    Elecronic Devices Inst., Nanjing, China
  • Volume
    57
  • Issue
    12
  • fYear
    2010
  • Firstpage
    3543
  • Lastpage
    3547
  • Abstract
    The arguments presented in the above comments are refuted. The following are pointed out: 1) Veliadis´ papers did not include the vertical-junction field-effect transistor (VJFET) dimensions required for readers to make technical analysis and comparison. 2) The current through the gate p-n junction of a VJFET is also affected by the ohmic contact and metal spreading resistance; therefore, the external gate terminal voltage alone does not determine whether a VJFET is operated in bipolar mode or not. 3) A longer vertical channel with a more invariant or uniform vertical-channel opening makes it much easier to realize higher performance and higher voltage normally-off JFETs because of the lower channel resistance and the larger drain voltage needed to punch through the drain-to-source barrier.
  • Keywords
    junction gate field effect transistors; ohmic contacts; p-n junctions; silicon compounds; 4H-SiC TI-VJFET; external gate terminal voltage; gate p-n junction; metal spreading resistance; ohmic contact; vertical-junction field-effect transistor; Ion implantation; JFETs; Power transistors; Silicon carbide; Junction field effect transistors (JFET); normally-off; normally-on; power transistors; silicon carbide; vertical channel;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2010.2079190
  • Filename
    5607303