Title :
Reply to Comments on “1.88-
1650-V Normally on 4H-SiC TI-VJFET”
Author :
Li, Yuzhu ; Alexandrov, Petre ; Zhao, Jian H.
Author_Institution :
Elecronic Devices Inst., Nanjing, China
Abstract :
The arguments presented in the above comments are refuted. The following are pointed out: 1) Veliadis´ papers did not include the vertical-junction field-effect transistor (VJFET) dimensions required for readers to make technical analysis and comparison. 2) The current through the gate p-n junction of a VJFET is also affected by the ohmic contact and metal spreading resistance; therefore, the external gate terminal voltage alone does not determine whether a VJFET is operated in bipolar mode or not. 3) A longer vertical channel with a more invariant or uniform vertical-channel opening makes it much easier to realize higher performance and higher voltage normally-off JFETs because of the lower channel resistance and the larger drain voltage needed to punch through the drain-to-source barrier.
Keywords :
junction gate field effect transistors; ohmic contacts; p-n junctions; silicon compounds; 4H-SiC TI-VJFET; external gate terminal voltage; gate p-n junction; metal spreading resistance; ohmic contact; vertical-junction field-effect transistor; Ion implantation; JFETs; Power transistors; Silicon carbide; Junction field effect transistors (JFET); normally-off; normally-on; power transistors; silicon carbide; vertical channel;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2010.2079190