Title :
Routing for manufacturability and reliability
Author :
Chen, Huang-Yu ; Chang, Yao-Wen
Author_Institution :
Grad. Inst. of Electron. Eng., Nat. Taiwan Univ., Taipei, Taiwan
Abstract :
As IC process geometries scale down to the nanometer territory, industry faces severe challenges of manufacturing limitations. To guarantee high yield and reliability, routing for manufacturability and reliability has played a pivotal role in resolution and thus yield enhancement for the imperfect manufacturing process. In this article, we introduce major routing challenges arising from nanometer process, survey key existing techniques for handling the challenges, and provide some future research directions in routing for manufacturability and reliability.
Keywords :
integrated circuits; nanotechnology; network routing; reliability; IC process geometry; manufacturability; network routing; reliability; Adaptive optics; Apertures; Chemicals; Etching; Lithography; Manufacturing industries; Manufacturing processes; Optical distortion; Resists; Routing;
Journal_Title :
Circuits and Systems Magazine, IEEE
DOI :
10.1109/MCAS.2009.933855
