DocumentCode :
1360247
Title :
Nano electrostatic discharge
Author :
Voldman, Steven H.
Author_Institution :
Intersil Corp., CA, USA
Volume :
3
Issue :
3
fYear :
2009
Firstpage :
12
Lastpage :
15
Abstract :
As nanostructures become smaller, the electrostatic sensitivity increases, leading to new failure mechanisms. In many new electrostatically actuated devices, electric forces lead to the motion of structural elements. Electrostatically actuated devices, magnetic recording devices, photomasks, RF switches, and micromachines have air gaps, which can lead to a breakdown across surfaces and in the air gap; the failure mechanism can lead to both latent and functional failures of the structure. Significant challenges are ahead of us in providing protection to these nanostructures from electrostatics.
Keywords :
air gaps; electrostatic discharge; inspection; integrated circuit manufacture; nanoelectronics; air gap; electric forces; electrostatic actuated devices; electrostatic sensitivity; inspection process manufacturing; magnetic recording devices; nanoelectrostatic discharge; nanostructure; photomask; Air gaps; Electric breakdown; Electrostatic discharge; Failure analysis; Magnetic recording; Magnetic switching; Nanostructures; Radio frequency; Surface discharges; Switches;
fLanguage :
English
Journal_Title :
Nanotechnology Magazine, IEEE
Publisher :
ieee
ISSN :
1932-4510
Type :
jour
DOI :
10.1109/MNANO.2009.934212
Filename :
5227812
Link To Document :
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