Abstract :
As nanostructures become smaller, the electrostatic sensitivity increases, leading to new failure mechanisms. In many new electrostatically actuated devices, electric forces lead to the motion of structural elements. Electrostatically actuated devices, magnetic recording devices, photomasks, RF switches, and micromachines have air gaps, which can lead to a breakdown across surfaces and in the air gap; the failure mechanism can lead to both latent and functional failures of the structure. Significant challenges are ahead of us in providing protection to these nanostructures from electrostatics.
Keywords :
air gaps; electrostatic discharge; inspection; integrated circuit manufacture; nanoelectronics; air gap; electric forces; electrostatic actuated devices; electrostatic sensitivity; inspection process manufacturing; magnetic recording devices; nanoelectrostatic discharge; nanostructure; photomask; Air gaps; Electric breakdown; Electrostatic discharge; Failure analysis; Magnetic recording; Magnetic switching; Nanostructures; Radio frequency; Surface discharges; Switches;