Title :
Development of compact gas cluster ion beam (GCIB) equipment and ultra-surface smoothing
Author :
Hanazono, K. ; Tokiguchi, K. ; Kataoka, I.
Author_Institution :
O.S.I Ind. Co., Ltd., Tokyo, Japan
fDate :
June 26 2014-July 4 2014
Abstract :
GCIB technology has been used for semiconductor, optical and magnetic device fabrications. It has also shown a possibility for nanometer level manufacturing. In recent requirement in materials processing, surface smoothing becomes important in a range of nanometer accuracy. This paper describes development of compact GCIB equipment for surface smoothing of lens molds and cutting tools. For the surface smoothing of WC lens mold and CVD diamond cutting tool, the roughness (Ra) of less than 1 nm has been achieved in a production scale. It has also been shown that the GCIB process could make the smoothing smaller than the grain size in these materials.
Keywords :
chemical vapour deposition; cutting tools; diamond; grain size; ion beams; lenses; nanotechnology; surface treatment; tungsten compounds; CVD diamond cutting tool; GCIB equipment; WC; gas cluster ion beam; grain size; lens molds; materials processing; nanometer level manufacturing; surface smoothing; Diamonds; Optical wavelength conversion; Radiation effects; Rough surfaces; Smoothing methods; Surface roughness; Surface treatment; CVD diamond; GCIB; WC; hard processing material;
Conference_Titel :
Ion Implantation Technology (IIT), 2014 20th International Conference on
Conference_Location :
Portland, OR
DOI :
10.1109/IIT.2014.6939978