• DocumentCode
    136165
  • Title

    Productivity improvements utilizing OptiScan, interlaced beam scanning, for Axcelis Purion XE implanter

  • Author

    Satoh, S. ; Coolbaugh, R. ; Geary, C. ; DeLuca, J.

  • Author_Institution
    Axcelis Technol., Beverly, MA, USA
  • fYear
    2014
  • fDate
    June 26 2014-July 4 2014
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    The Axcelis Purion XE is a RF linac based single wafer, hybrid scan, high energy ion implanter. The Purion XE provides customers the highest mechanical throughput with best in class beam currents. It is also equipped with features to fully utilize its high beam current capability such as IntelliScan. IntelliScan maintains precise dose and uniformity even under conditions of extreme photoresist outgassing due to high beam power. To further enhance the Purion XE´s industry leading productivity, OptiScan, a system for enhancing the beam utilization, has been developed.
  • Keywords
    ion implantation; photoresists; Axcelis Purion XE implanter; IntelliScan; OptiScan; RF linac based single wafer; class beam currents; extreme photoresist outgassing; high energy ion implanter; hybrid scan; interlaced beam scanning; productivity improvements; Implants; Ion beams; Ion implantation; Logic gates; Monitoring; Throughput; Xenon; Beam utilization; beam scan; dose control;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ion Implantation Technology (IIT), 2014 20th International Conference on
  • Conference_Location
    Portland, OR
  • Type

    conf

  • DOI
    10.1109/IIT.2014.6940026
  • Filename
    6940026