DocumentCode :
136174
Title :
VIISta HCPt: High current productivity solution for flash devices
Author :
Perel, Alex ; Bassom, Neil ; Chaney, Craig ; Chennadi, Sruthi ; Cucchetti, Antonella ; Klein, John ; Young, James
Author_Institution :
Varian Semicond. Equip., Appl. Mater., Inc., Gloucester, MA, USA
fYear :
2014
fDate :
June 26 2014-July 4 2014
Firstpage :
1
Lastpage :
3
Abstract :
In this paper we introduce the VIISta HCPt: a powerful upgrade to the proven VIISta High Current platform that delivers higher productivity and DPY advantages for Flash device manufacturers. Multiple HCPt units are currently running in production. A new source technology, added beam modulation capability, and an innovative tuning algorithm are integrated to provide higher productivity in the higher energy range. The new source design generates more efficient plasma to achieve increased extraction currents without compromising source life. A new tuning algorithm enables better transmission through the beam-line. A quadrupole lens has also been added for vertical beam height control, enabling higher beam currents at equivalent or lower dose rates. In addition to discussing the new innovative optical components, data on beam current, source life, and dose rate modulation are presented.
Keywords :
flash memories; ion beam effects; DPY advantages; VIISta HCPt; VIISta high current platform; added beam modulation capability; beam-line; extraction currents; flash device manufacturers; innovative tuning algorithm; quadrupole lens; source life; vertical beam height control; Cathodes; Ion sources; Lenses; Magnetic analysis; Particle beams; Plasmas; Tuning;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ion Implantation Technology (IIT), 2014 20th International Conference on
Conference_Location :
Portland, OR
Type :
conf
DOI :
10.1109/IIT.2014.6940035
Filename :
6940035
Link To Document :
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