DocumentCode
136174
Title
VIISta HCPt: High current productivity solution for flash devices
Author
Perel, Alex ; Bassom, Neil ; Chaney, Craig ; Chennadi, Sruthi ; Cucchetti, Antonella ; Klein, John ; Young, James
Author_Institution
Varian Semicond. Equip., Appl. Mater., Inc., Gloucester, MA, USA
fYear
2014
fDate
June 26 2014-July 4 2014
Firstpage
1
Lastpage
3
Abstract
In this paper we introduce the VIISta HCPt: a powerful upgrade to the proven VIISta High Current platform that delivers higher productivity and DPY advantages for Flash device manufacturers. Multiple HCPt units are currently running in production. A new source technology, added beam modulation capability, and an innovative tuning algorithm are integrated to provide higher productivity in the higher energy range. The new source design generates more efficient plasma to achieve increased extraction currents without compromising source life. A new tuning algorithm enables better transmission through the beam-line. A quadrupole lens has also been added for vertical beam height control, enabling higher beam currents at equivalent or lower dose rates. In addition to discussing the new innovative optical components, data on beam current, source life, and dose rate modulation are presented.
Keywords
flash memories; ion beam effects; DPY advantages; VIISta HCPt; VIISta high current platform; added beam modulation capability; beam-line; extraction currents; flash device manufacturers; innovative tuning algorithm; quadrupole lens; source life; vertical beam height control; Cathodes; Ion sources; Lenses; Magnetic analysis; Particle beams; Plasmas; Tuning;
fLanguage
English
Publisher
ieee
Conference_Titel
Ion Implantation Technology (IIT), 2014 20th International Conference on
Conference_Location
Portland, OR
Type
conf
DOI
10.1109/IIT.2014.6940035
Filename
6940035
Link To Document