Title :
Comparison of power dependence of microwave surface resistance of unpatterned and patterned YBCO thin film
Author :
Xin, Hao ; Oates, Daniel E. ; Anderson, A.C. ; Slattery, R.L. ; Dresselhaus, G. ; Dresselhaus, M.S.
Author_Institution :
Dept. of Phys., MIT, Cambridge, MA, USA
fDate :
7/1/2000 12:00:00 AM
Abstract :
The effect of the patterning process on the nonlinearity of the microwave surface resistance Rs of YBCO thin films is investigated in this paper. With the use of a sapphire dielectric resonator and a stripline resonator, the microwave Rs of YBCO thin films was measured before and after the patterning process, as a function of temperature and the RF peak magnetic field in the film. The microwave loss was also modeled, assuming a Jrf2 dependence of Zs(Jrf) on current density Jrf . Experimental and modeled results show that the patterning has no observable effect on the microwave residual Rs or on the power dependence of Rs
Keywords :
barium compounds; current density; electric resistance; high-temperature superconductors; photolithography; strip line resonators; strip lines; superconducting microwave devices; superconducting resonators; superconducting thin films; yttrium compounds; HTSC thin film; RF peak magnetic field dependence; YBaCuO; current density; etching; microwave loss; microwave surface resistance; nonlinearity; patterned thin film; patterning process effect; photolithography; power dependence; sapphire dielectric resonator; stripline resonator; superconducting microwave devices; superconducting striplines; temperature dependence; unpatterned thin film; Dielectric measurements; Dielectric thin films; Electrical resistance measurement; Magnetic field measurement; Magnetic films; Microwave measurements; Stripline; Surface resistance; Temperature; Yttrium barium copper oxide;
Journal_Title :
Microwave Theory and Techniques, IEEE Transactions on