DocumentCode :
136177
Title :
Estimation of plasma density distribution in IHC source by means of FEM calculation
Author :
Sato, Mitsuhisa ; Kawaguchi, Hitoshi ; Nagai, Takayuki ; Kabasawa, Mitsuaki ; Tsukihara, Mitsukuni
Author_Institution :
Eng. Div., SEN Corp., Saijo, Japan
fYear :
2014
fDate :
June 26 2014-July 4 2014
Firstpage :
1
Lastpage :
4
Abstract :
In order to obtain higher beam current extraction with better quality, it is very important to identify plasma density distribution inside the indirectly heated cathode (IHC) ion source. In this paper, the calculations of the plasma density distribution are introduced, applying the finite element method (FEM) of anisotropic thermal conduction with the special modeling near the plasma sheath to ambipolar plasma diffusion. The results of calculation show good agreement with experimental results and indicate better geometry of the IHC ion source.
Keywords :
cathodes; finite element analysis; heat conduction; ion implantation; ion sources; plasma density; plasma sheaths; FEM calculation; IHC source; ambipolar plasma diffusion; anisotropic thermal conduction; beam current extraction; finite element method; indirectly heated cathode ion source; plasma density distribution estimation; plasma sheath; Cathodes; Finite element analysis; Ion sources; Plasma temperature; Temperature measurement; Thermal conductivity; FEM calculation; IHC ion source; ambipolar plasma diffusion; plasma density distribution;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ion Implantation Technology (IIT), 2014 20th International Conference on
Conference_Location :
Portland, OR
Type :
conf
DOI :
10.1109/IIT.2014.6940038
Filename :
6940038
Link To Document :
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