DocumentCode :
1361816
Title :
Monte Carlo simulation of microwave noise temperature in cooled GaAs and InP
Author :
Pantoja, Jose Miguel Miranda ; Lin, Chih-I ; Shaalan, Mohamed ; Sebastian, Jose Luis ; Hartnagel, Hans L.
Author_Institution :
Dept. de Fisica Aplicada III, Univ. Complutense de Madrid, Spain
Volume :
48
Issue :
7
fYear :
2000
fDate :
7/1/2000 12:00:00 AM
Firstpage :
1275
Lastpage :
1279
Abstract :
A simulation at microscopic level of the intrinsic microwave noise temperature associated with GaAs and InP semiconductors under far from equilibrium conditions has been performed. The dependence of the noise temperature on the electric field, doping level, and physical temperature has been investigated, and the results show the existence of threshold fields above which electron heating and partition noise due to intervalley scattering can make the cooling inefficient in terms of noise improvements. A comparison with available experimental data has also been made to verify the accuracy of the models used in the simulation
Keywords :
III-V semiconductors; Monte Carlo methods; doping profiles; microwave transistors; semiconductor device models; semiconductor device noise; GaAs; InP; Monte Carlo simulation; doping level; electric field; electron heating; intervalley scattering; microscopic level; microwave noise temperature; noise improvements; partition noise; physical temperature; threshold fields; Electromagnetic heating; Electrons; Gallium arsenide; Indium phosphide; Microscopy; Noise level; Resistance heating; Semiconductor device doping; Semiconductor device noise; Temperature dependence;
fLanguage :
English
Journal_Title :
Microwave Theory and Techniques, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9480
Type :
jour
DOI :
10.1109/22.853472
Filename :
853472
Link To Document :
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