• DocumentCode
    136182
  • Title

    SAion - SEN´s unique solution for 450mm ion implant

  • Author

    Suetsugu, Noriyuki ; Tsukihara, Mitsukuni ; Kabasawa, Mitsuaki ; Sato, Fumiaki ; Yagita, Takanori

  • Author_Institution
    Eng. Div., SEN Corp., Saijo, Japan
  • fYear
    2014
  • fDate
    June 26 2014-July 4 2014
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    The SAion-450 is a leading-edge ion implanter developed for the upcoming 450mm wafer generation. The SAion-450 has extremely wide process coverage and productivity throughout both the medium current (MC) and high current (HC) process ranges. Although the area of a 450mm wafer is 2.25 times larger than that of a 300mm wafer, the SAion-450 can process typical MC recipes with higher productivity than the current 300mm MC implanter, the MC3-II/GP. Additionally, low energy (LE) productivity can be significantly enhanced with the addition of the LE beam line option. This can be easily installed (or removed) in a production fab. The SAion product line also includes a 300mm model. The SAion-300 is equipped with the same beamline as the SAion-450 in order to deliver the same process characteristics in 300mm fabs as in 450mm wafer lines. Thus, the SAion series can serve as a bridge tool to assure smooth wafer size transition from 300mm to 450mm.
  • Keywords
    ion beam effects; ion implantation; LE beam line option; MC implanter; MC3-II-GP; SAion product line; SAion-450; high current process ranges; leading-edge ion implanter; low energy productivity; medium current process ranges; size 300 mm; size 450 mm; wafer generation; wafer size transition; Atomic beams; Bridges; Implants; Productivity; Semiconductor device modeling; Throughput; 450mm; Ion Implanter; SAion; Wide range;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ion Implantation Technology (IIT), 2014 20th International Conference on
  • Conference_Location
    Portland, OR
  • Type

    conf

  • DOI
    10.1109/IIT.2014.6940043
  • Filename
    6940043