Title :
SAion - SEN´s unique solution for 450mm ion implant
Author :
Suetsugu, Noriyuki ; Tsukihara, Mitsukuni ; Kabasawa, Mitsuaki ; Sato, Fumiaki ; Yagita, Takanori
Author_Institution :
Eng. Div., SEN Corp., Saijo, Japan
fDate :
June 26 2014-July 4 2014
Abstract :
The SAion-450 is a leading-edge ion implanter developed for the upcoming 450mm wafer generation. The SAion-450 has extremely wide process coverage and productivity throughout both the medium current (MC) and high current (HC) process ranges. Although the area of a 450mm wafer is 2.25 times larger than that of a 300mm wafer, the SAion-450 can process typical MC recipes with higher productivity than the current 300mm MC implanter, the MC3-II/GP. Additionally, low energy (LE) productivity can be significantly enhanced with the addition of the LE beam line option. This can be easily installed (or removed) in a production fab. The SAion product line also includes a 300mm model. The SAion-300 is equipped with the same beamline as the SAion-450 in order to deliver the same process characteristics in 300mm fabs as in 450mm wafer lines. Thus, the SAion series can serve as a bridge tool to assure smooth wafer size transition from 300mm to 450mm.
Keywords :
ion beam effects; ion implantation; LE beam line option; MC implanter; MC3-II-GP; SAion product line; SAion-450; high current process ranges; leading-edge ion implanter; low energy productivity; medium current process ranges; size 300 mm; size 450 mm; wafer generation; wafer size transition; Atomic beams; Bridges; Implants; Productivity; Semiconductor device modeling; Throughput; 450mm; Ion Implanter; SAion; Wide range;
Conference_Titel :
Ion Implantation Technology (IIT), 2014 20th International Conference on
Conference_Location :
Portland, OR
DOI :
10.1109/IIT.2014.6940043