DocumentCode :
1361836
Title :
Field-enhanced nonequilibrium C/V and I/V characteristics of MOS capacitor under linear voltage ramp bias
Author :
Zhang, X. ; Ding, K.
Author_Institution :
Dept. of Electron. Eng., Hangzhou Univ., China
Volume :
143
Issue :
6
fYear :
1996
fDate :
12/1/1996 12:00:00 AM
Firstpage :
343
Lastpage :
347
Abstract :
A theoretical method is presented to analytically describe nonequilibrium C/V and I/V characteristics of an MOS capacitor under linear voltage ramp bias. Unlike previous theories the carrier emission probability is assumed to be field-dependent and therefore the transients are known as field enhanced. The one-dimensional Poole-Frenkel model is used to describe the carrier-emission probability dependent on the applied electric field. It has been verified that this model is available for coulombic centres. A differential equation is established to describe the change of the space-charge region width with time. The MOS capacitance and gate current are related to the space-charge region width. In this way the field enhanced nonequilibrium C/V and I/V characteristics are obtained
Keywords :
MOS capacitors; differential equations; semiconductor device models; space charge; C/V and I/V characteristics; Field-enhanced nonequilibrium C/V and I/V characteristics; I/V characteristics; MOS capacitor; applied electric field; carrier emission probability; coulombic centres; differential equation; linear voltage ramp bias; one-dimensional Poole-Frenkel model; space-charge region width; transients;
fLanguage :
English
Journal_Title :
Circuits, Devices and Systems, IEE Proceedings -
Publisher :
iet
ISSN :
1350-2409
Type :
jour
DOI :
10.1049/ip-cds:19960724
Filename :
561132
Link To Document :
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