• DocumentCode
    1361836
  • Title

    Field-enhanced nonequilibrium C/V and I/V characteristics of MOS capacitor under linear voltage ramp bias

  • Author

    Zhang, X. ; Ding, K.

  • Author_Institution
    Dept. of Electron. Eng., Hangzhou Univ., China
  • Volume
    143
  • Issue
    6
  • fYear
    1996
  • fDate
    12/1/1996 12:00:00 AM
  • Firstpage
    343
  • Lastpage
    347
  • Abstract
    A theoretical method is presented to analytically describe nonequilibrium C/V and I/V characteristics of an MOS capacitor under linear voltage ramp bias. Unlike previous theories the carrier emission probability is assumed to be field-dependent and therefore the transients are known as field enhanced. The one-dimensional Poole-Frenkel model is used to describe the carrier-emission probability dependent on the applied electric field. It has been verified that this model is available for coulombic centres. A differential equation is established to describe the change of the space-charge region width with time. The MOS capacitance and gate current are related to the space-charge region width. In this way the field enhanced nonequilibrium C/V and I/V characteristics are obtained
  • Keywords
    MOS capacitors; differential equations; semiconductor device models; space charge; C/V and I/V characteristics; Field-enhanced nonequilibrium C/V and I/V characteristics; I/V characteristics; MOS capacitor; applied electric field; carrier emission probability; coulombic centres; differential equation; linear voltage ramp bias; one-dimensional Poole-Frenkel model; space-charge region width; transients;
  • fLanguage
    English
  • Journal_Title
    Circuits, Devices and Systems, IEE Proceedings -
  • Publisher
    iet
  • ISSN
    1350-2409
  • Type

    jour

  • DOI
    10.1049/ip-cds:19960724
  • Filename
    561132