Title :
Formation of non-equilibrium sputtered Cr films used in thin film HD recording media
Author :
Chu, J.P. ; Chang, J.W. ; Lee, P.Y.
Author_Institution :
Inst. of Mater. Eng., Nat. Taiwan Univ., Taipei, Taiwan
fDate :
3/1/1998 12:00:00 AM
Abstract :
Formation and phase transformation of non-equilibrium δ-A15 Cr thin films prepared by r.f. magnetron sputtering have been characterized. Processing parameters such as working pressure, deposition time and temperature were found to affect the formation of δ-A15 Cr films. We have demonstrated for the first time that the phase transformation of the δ-A15 Cr phase to the equilibrium α-BCC Cr phase is an irreversible, exothermic, first-order transition. Onset and peak temperatures of the transformation were determined to be 4280C and 437°C, respectively, at a heating rate of 100C/mln. Our post-deposition annealing study by X-ray diffraction further verified the occurrence of transformation
Keywords :
X-ray diffraction; annealing; chromium; ferromagnetic materials; magnetic recording; magnetic thin films; solid-state phase transformations; sputtered coatings; thermal analysis; 428 degC; 437 degC; Cr; RF magnetron sputtering; X-ray diffraction; deposition time; exothermic first-order transition; heating rate; nonequilibrium sputtered films; onset temperatures; peak temperatures; phase transformation; post-deposition annealing; thin film HD recording media; working pressure; Annealing; Chromium; Crystalline materials; Heating; High definition video; Magnetic materials; Ocean temperature; Sputtering; X-ray diffraction; X-ray scattering;
Journal_Title :
Magnetics, IEEE Transactions on
